Influence of BCl3/NH3 flow ratio on growth and microstructure of CVI-processed boron nitride interfacial coatings

Dai, Jianwei; Wang, Yiguang; Xu, Zhenhua; Mu, Rende; He, Limin

doi:10.1016/j.vacuum.2020.109484

Cited by 6 publications

(1 citation statement)

References 26 publications

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“…Different growth strategies are summarized in Table 1 . When non-catalytic ceramic substrates are employed, the resulting films were of amorphous or turbostatic structures, depending on the growth temperature [ 19 , 20 , 27 , 28 , 29 , 30 ]. These films were used in coating nanoparticles, fiber fabrics, or achieving an ultrasmooth substrate for novel 2D electronics.…”

Section: Discussionmentioning

confidence: 99%

Synthesis of Atomically Thin h-BN Layers Using BCl3 and NH3 by Sequential-Pulsed Chemical Vapor Deposition on Cu Foil

2021

Nanomaterials

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The chemical vapor deposition of hexagonal boron nitride layers from BCl3 and NH3 is highly beneficial for scalable synthesis with high controllability, yet multiple challenges such as corrosive reaction or by-product formation have hindered its successful demonstration. Here, we report the synthesis of polycrystalline hexagonal boron nitride (h-BN) layers on copper foil using BCl3 and NH3. The sequential pulse injection of precursors leads to the formation of atomically thin h-BN layers with a polycrystalline structure. The relationship between growth temperature and crystallinity of the h-BN film is investigated using transmission electron microscopy and Raman spectroscopy. Investigation on the initial growth mode achieved by the suppression of precursor supply revealed the formation of triangular domains and existence of preferred crystal orientations. The possible growth mechanism of h-BN in this sequential-pulsed CVD is discussed.

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Section: Discussionmentioning

confidence: 99%

Synthesis of Atomically Thin h-BN Layers Using BCl3 and NH3 by Sequential-Pulsed Chemical Vapor Deposition on Cu Foil

2021

Nanomaterials

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Atomic layer deposited boron nitride nanoscale films act as high temperature hydrogen barriers

Bull

Champ

Raj

et al. 2021

Applied Surface Science

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Characterization of BN interface and its effect on the mechanical behavior of SiCf/SiC composites

Sun

Liu

et al. 2023

Vacuum

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Influence of BCl3/NH3 flow ratio on growth and microstructure of CVI-processed boron nitride interfacial coatings

Cited by 6 publications

References 26 publications

Synthesis of Atomically Thin h-BN Layers Using BCl3 and NH3 by Sequential-Pulsed Chemical Vapor Deposition on Cu Foil

Synthesis of Atomically Thin h-BN Layers Using BCl3 and NH3 by Sequential-Pulsed Chemical Vapor Deposition on Cu Foil

Atomic layer deposited boron nitride nanoscale films act as high temperature hydrogen barriers

Characterization of BN interface and its effect on the mechanical behavior of SiCf/SiC composites

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