Influence of Deposition Condition on Y₂O₃Coatings Produced by Pulsed Electrophoretic Deposition

Abstract

Y2O3nanoparticle suspension aqueous solution was prepared using citric acid. Then, Y2O3film was deposited using this solution with pulsed electrophoretic deposition (EPD). A dense Y2O3film of 25.7 μm thickness was obtained with deposition conditions of 0.5 wt% Y2O3concentration, bias voltage of 0.5 V, and bias frequency of 1 kHz. The respective resistivities of the as-deposited film and films heat-treated at 200°C and 400°C were 2.84 × 103 Ω·cm, 5.36 × 104 Ω·cm, and 2.05 × 106 Ω·cm. A 59.8 μm thick dense Y2O3film was obtained using two-step deposition with change of the bias voltage: a first step of 0.5 V and a second step of 2.0 V.

Review of Green Synthesis and Anticorrosion Applications for Yttrium Oxide Nanoparticles

“…Miyazaki and his colleagues placed Y 2 O 3 NPs films using the pulsed EPD technique. 29 It was found that the best deposition conditions for this approach include employing a low concentration of yttrium nanoparticles in the presence of low pressure and high frequency. When the concentration of Y 2 O 3 NPs in a solution was raised, the thickness of the film was considerably decreased.…”

Fabrication of radiative cooling devices using Si₂N₂O nano-particles

“…6),7) A Si 2 N 2 O radiative cooling device can thus be formed easily using the abovementioned Si 2 N 2 O particles with the pulsed EPD method. 6), 7) In the present investigation, we synthesized Si 2 N 2 O particles using the previously reported method, 5) and fabricated radiative cooling devices with Si 2 N 2 O coatings on metal Al plates using Si 2 N 2 O nano-particle with a pulsed EPD. Furthermore, we evaluated the radiative cooling ability of the obtained devices.…”