Investigations on residual strains and the cathodoluminescence and electron beam induced current signal of grain boundaries in silicon J. Appl. Phys. 115, 163511 (2014) Potential variations across the grain boundaries (GBs) in a 100 nm thick undoped n-BaSi 2 film on a cast-grown multicrystalline Si (mc-Si) substrate are evaluated using Kelvin probe force microscopy (KFM). The h-2h X-ray diffraction pattern reveals diffraction peaks, such as (201), (301), (410), and (411) of BaSi 2 . Local-area electron backscatter diffraction reveals that the a-axis of BaSi 2 is tilted slightly from the surface normal, depending on the local crystal plane of the mc-Si. KFM measurements show that the potentials are not significantly disordered in the grown BaSi 2 , even around the GBs of mc-Si. The potentials are higher at GBs of BaSi 2 around Si GBs that are formed by grains with a Si(111) face and those with faces that deviate slightly from Si(111). Thus, downward band bending occurs at these BaSi 2 GBs. Minority carriers (holes) undergo a repelling force near the GBs, which may suppress recombination as in the case of undoped n-BaSi 2 epitaxial films on a single crystal Si (111)