2013
DOI: 10.1109/led.2012.2236296
|View full text |Cite
|
Sign up to set email alerts
|

Influence of Guard-Ring Structure on the Dark Count Rates of Silicon Photomultipliers

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1
1

Citation Types

1
10
0

Year Published

2014
2014
2023
2023

Publication Types

Select...
7
1

Relationship

1
7

Authors

Journals

citations
Cited by 14 publications
(11 citation statements)
references
References 9 publications
1
10
0
Order By: Relevance
“…In this case, trenches are filled with silicon dioxide: because of the different refractive index of silicon, they also provide "partial" optical isolation, due to reflections at the interface (which depends on the incident angle). An analysis of the different cell isolation technique in SiPM can be found in [36]. The active area is defined by high energy ion implantation (enrichment implant), which increases the electric field only in the active area, to reach the avalanche condition.…”
Section: Recent Sipm Improvementsmentioning
confidence: 99%
“…In this case, trenches are filled with silicon dioxide: because of the different refractive index of silicon, they also provide "partial" optical isolation, due to reflections at the interface (which depends on the incident angle). An analysis of the different cell isolation technique in SiPM can be found in [36]. The active area is defined by high energy ion implantation (enrichment implant), which increases the electric field only in the active area, to reach the avalanche condition.…”
Section: Recent Sipm Improvementsmentioning
confidence: 99%
“…Photon detection efficiency (PDE) is the most critical performance indicator for SiPMs. In recent years, the PDE of SiPMs has been significantly improved by different methods, such as reducing noise (Acerbi et al, 2015;Asano et al, 2018) and developing high-density (HD) cell with both small size and high filling factor (Acerbi et al, 2017;Sul et al, 2013).…”
Section: Sipms With Spectral Sensitivity Optimized For Vuv Detectionmentioning
confidence: 99%
“…The primary noise has been reduced, being now at the level of 50-100 kcps/mm 2 [48][49][50][51][52] at T = 20°C (see Figure 9b). The correlated noise has also been reduced due to: (i) an improvement in the silicon materials [43] and (ii) a better cell-to-cell isolation with trenches [46,49,53]. In particular, some examples are: CT probability of 10%, at 8 V of excess bias, with 15 μm cell pitch [48], which increases to 35%, with 7 V of excess bias when the cell pitch is 30 μm, or CT probability of just 3% in a 50 μm cell, with 3 V of excess bias, due to better cell isolation [49].…”
Section: Sipm Performancementioning
confidence: 99%