2013
DOI: 10.1016/j.tsf.2013.06.036
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Influence of HPPMS pulse length and inert gas mixture on the properties of (Cr,Al)N coatings

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Cited by 52 publications
(23 citation statements)
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“…Binary and ternary metal nitrides, such as CrN and (Cr,Al)N deposited by physical vapor deposition (PVD) have been investigated as protective coatings for different technical applications . During their application on the surface of tools for plastic processing, these coating materials are subjected to several normal or lateral loads, for example, by hard fillers existing in the plastic melts .…”
Section: Introductionmentioning
confidence: 99%
“…Binary and ternary metal nitrides, such as CrN and (Cr,Al)N deposited by physical vapor deposition (PVD) have been investigated as protective coatings for different technical applications . During their application on the surface of tools for plastic processing, these coating materials are subjected to several normal or lateral loads, for example, by hard fillers existing in the plastic melts .…”
Section: Introductionmentioning
confidence: 99%
“…TiVCN as well as TiVN hard coatings can be the other potential wear resistance coatings which make it can replace the conventional TiN coatings. During decades, ternary transition metal nitrides such as (Ti,Al)N and (Cr,Al)N have been attracting great interest for applications as hard protective coating materials due to their high hardness, good wear resistance and excellent corrosion protection [1][2][3][4][5][6]. Extensively investigations have extended to multilayered TiAlN/CrAlN [7][8] and additional metal dope [9][10] ternary transition metal nitrides.…”
Section: Introductionmentioning
confidence: 99%
“…Such behavior motivates us to use some artificial viscous term as explain in [43] to improve the convergence. Images from scanning electron microscopy www.gamm-mitteilungen.org (SEM) show that a columnar grain morphology is observed for a certain range of process parameters [20,44]. The grain morphology depends on various conditions like the temperature and pressure at which the deposition takes place.…”
Section: Computational Example -Nanoindentationmentioning
confidence: 99%