Influence of Magnetron Sputtering Parameters on Surface Properties of TiN-Coated Bearing Steel

Yan, Nu; Xiong, Xiao Chen

doi:10.4028/www.scientific.net/amr.785-786.970

Search citation statements

Order By: Relevance

Paper Sections

Select...

Introduction1

Citation Types

Supporting

Mentioning

Contrasting

Year Published

2016

2023

Publication Types

Select...

Article2

Relationship

Self Cite0

Independent2

Authors

Journals

Cited by 2 publications

(1 citation statement)

References 5 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Magnetron sputtering is used extensively in the semiconductor industry. The sputtered films have a composition close to that of the source material and typically have a better adhesion on the substrate than evaporated films [4].…”

Section: Introductionmentioning

confidence: 99%

Investigation on the Effect of the Substrate Temperature on the Photoelectric Properties of the Ga Doped ZnO Film

Zhao¹,

Shi²,

Tian³

2016

MSF

View full text Add to dashboard Cite

The Ga doped ZnO film (GZO) was fabricated via magnetron sputtering on the substrate of silica glass. The effect of substrate temperature on the photoelectric properties of GZO film, such as morphology, grain size, crystal structure and transparency was studied. The results showed us that the crystallinity of GZO film was improved by increasing the substrate temperature . The GZO film exhibited high transmittance (above 80% in the visible region) at the substrate temperature higher than 200°C. The lowest resistivity of 4.45×10-4Ω·cm and highest hall mobility of 11.7 cm2 v-1s-1 were obtained when the substrate temperature was 300°C.

show abstract

Section: Introductionmentioning

confidence: 99%