2005
DOI: 10.1002/pssc.200460513
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Influence of oxygen on the dislocation related luminescence centers in silicon

Abstract: Dislocation related luminescence (DRL) centres in Si have high stability to a thermal treatment of samples and a relatively low temperature quenching. These properties make them an attractive candidate for production of Si based light emitting diodes (LEDs). The low energy part of DRL in the vicinity of the D1 line is the most promising from this point of view due to its highest temperature stability and best coupling to fiber optics. Actually this part of DRL can be divided into several bands. One of them wit… Show more

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Cited by 19 publications
(25 citation statements)
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“…1). According to [5,7] the dependence of the high energy shoulder on the excitation power implies its DA origin, as has been previously assumed for the low energy shoulder [4]. It should be noted that these two shoulders in general can not be observed simultaneously.…”
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confidence: 88%
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“…1). According to [5,7] the dependence of the high energy shoulder on the excitation power implies its DA origin, as has been previously assumed for the low energy shoulder [4]. It should be noted that these two shoulders in general can not be observed simultaneously.…”
mentioning
confidence: 88%
“…However, it is not the standard D1 line at 807 meV, but a wide band with a maximum around 813 meV. Moreover, the position of this band is not fixed, but varies due to the particular parameters of the thermal treatment [7]. This point is well illustrated by the spectrum of sample b2-1 obtained after quenching of the as-deformed sample in water.…”
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confidence: 92%
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