Influence of oxygen partial pressure on laser-induced damage resistance of ZrO2 films in vacuum

Effects of oxygen flow on properties of La2Ti2O7−x films

“…In contrast, La 2 Ti 2 O 7−x film has a higher LIDT and better process stability. At the same time, the conclusion of this paper is consistent with the results of other researchers [22][23][24], that is, the more fully oxidized the film, the less the sub stoichiometric composition, and the higher LIDT of the film.…”

“…It can be explained that during the deposition process, the loss of oxygen results in a decrease in the absorption of larger sub stoichiometric components. The result is consistent with the researchers' study of the oxygen partial pressure on the ZrO 2 film [23,24]. The film is destroyed due to the thermo mechanical coupling effect, while the thermal absorption of the metallic film is larger than that of the dielectric film.…”

Structural and Optical Properties of Thermally Oxidized Zirconium Dioxide Films

“…These different phases can be tailored made in thin films achieve required hardness, refractive index and optical band gap. Various physical deposition techniques such as thermal oxidation of zirconium films [12,13], electron beam evaporation [14][15][16][17], pulsed laser deposition [18,19], vacuum arc deposition [20,21], DC magnetron sputtering [22][23][24][25], RF magnetron sputtering [26][27][28][29][30], molecular beam epitaxy [31], and chemical deposition methods namely, chemical bath deposition [32], spray pyrolysis [33], sol-gel process [34][35][36] and atomic layer deposition [37,38] were employed for the growth of zirconium dioxide thin films. Among these techniques, magnetron sputtering has the advantage in the growth of films on large area substrates and at low substrate temperatures.…”

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“…The as-deposited films exhibited the absorption bands at 406cm -1 , 480 cm -1 , 565 cm -1 , 607 cm -1 and 669 cm -1 . The absorption bands located at 406cm -1 and 480 cm -1 related to the stretching vibrations of Zr-O, 11 and the bands seen at 565 cm -1 , 607 cm -1 and 669 cm -1 were the characteristic vibrations of ZrO 2 . 12 In the case of annealed films, the absorption band at 480 cm -1 and 669 cm -1 were disappeared and shift in the observed binding energies were noticed.…”

“…10 Various deposition methods namely thermal oxidation of zirconium films, electron beam evaporation, pulsed laser deposition, DC / RF magnetron sputtering, sol-gel process and spray pyrolysis were employed for preparation of ZrO 2 thin films. [11][12][13][14][15] In this investigation, an attempt is made in the deposition of tetragonal structured and transparent ZrO 2 thin films by DC reactive magnetron sputtering technique. The as-deposited ZrO 2 thin films were annealed in air at a fixed temperature of 450 o C for an hour.…”