As building blocks of multifunctional
materials involving coupling at the nanoscale, highly doped semiconductor
nanocrystals are of great interest for potential applications in nanophotonics.
In this work, we investigate the plasmonic properties of highly doped
Si nanocrystals embedded in a silica matrix. These materials are obtained
by evaporation of heavily phosphorus-doped SiO/SiO2 multilayers
in an ultrahigh vacuum chamber followed by rapid thermal annealing.
For P contents between 0.7 and 1.9 atom %, structural investigations
at the nanoscale give clear evidence that P atoms are mainly located
in the core of Si nanocrystals with concentrations reaching up to
10 atom %, i.e., well beyond the solid solubility limit of P in bulk
Si. Alloying and formation of SiP nanoparticles are observed for P
contents exceeding 4 atom % in the multilayer. Infrared absorption
measurements give evidence of a localized surface plasmon resonance
located in the 3–6 μm range. A core–shell structure
was used to model Si nanocrystals embedded in a silica matrix. Based
on the Mie theory and the Drude model, both the mobility and the free
charge carrier density were extracted from the simulation, with values
reaching 27 cm2 V–1 s–1 and 2.3 × 1020 cm–3, respectively.
This results in a dopant activation rate of about 8%.