2010
DOI: 10.1557/proc-1258-p02-05
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Influence of Silicon Doping on the SA-MOVPE of InAs Nanowires

Abstract: The influence of Si-doping on the growth and material characteristics of InAs nanowires deposited by metal-organic vapor phase epitaxy (MOVPE) was investigated. It was observed that above a certain partial pressure ratio, doping has an influence on the morphology. The nanowires exhibit better uniformity but lower height vs. diameter aspect ratio as the supply of the dopant increases. It was consistantly found that the specific conductance of the nanowires also increases. Moreover the electrical measurements sh… Show more

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Cited by 4 publications
(6 citation statements)
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“…We note that decreasing the stacking fault density by reducing r g did not give rise to a less spread behavior or to a higher conductivity of SA MOVPE grown nanowires. However, we observed a significant decrease of resistivity and its statistical spread in intentionally doped SA MOVPE nanowires, as published previously [1]. The similar behavior of nominally undoped VLS MOVPE wires shown here and intentionally doped SA MOVPE wires in [1] may be an indicator for unintentional carbon doping in VLS MOVPE due to an incomplete group III precursor decomposition at the relatively low T g of 400…”
Section: Electrical Propertiessupporting
confidence: 90%
See 1 more Smart Citation
“…We note that decreasing the stacking fault density by reducing r g did not give rise to a less spread behavior or to a higher conductivity of SA MOVPE grown nanowires. However, we observed a significant decrease of resistivity and its statistical spread in intentionally doped SA MOVPE nanowires, as published previously [1]. The similar behavior of nominally undoped VLS MOVPE wires shown here and intentionally doped SA MOVPE wires in [1] may be an indicator for unintentional carbon doping in VLS MOVPE due to an incomplete group III precursor decomposition at the relatively low T g of 400…”
Section: Electrical Propertiessupporting
confidence: 90%
“…However, InAs nanowires grown by either SA MOVPE or MBE do not exhibit the expected quasimetallic behaviour. In contrast, a quite high resistance has been measured [1]. InAs nanowires have the tendency to form stacking faults during growth since the difference in formation energy between the ZB and the WZ phase is very small [2].…”
mentioning
confidence: 97%
“…In contrast, they show semiconductor behavior, i.e., an increase of the resistance with decreasing temperature, and are quite resistive at room temperature. 23 The reason for the low conductivity of our nanowires is not clear, so far.…”
Section: Introductionmentioning
confidence: 89%
“…Au particles, serve as seeds for the nanowire growth [20,21]. Alternatively, InAs nanowires can also be grown by selective-area growth [22][23][24][25], self-induced growth [26,27] or by using In droplets as seed particles on a SiO x covered substrate [13]. Depending on the growth method and the growth parameters, the structural and transport properties can vary substantially.…”
Section: Introductionmentioning
confidence: 99%