Influence of substrate bias voltage on the properties of magnetron sputtered Cu2O films

Reddy, A. Sivasankar; Rao, G. Venkata; Uthanna, S.; Reddy, P. Sreedhara

doi:10.1016/j.physb.2005.08.041

Cited by 20 publications

(5 citation statements)

References 20 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…13 The formation of anisotropic crystallographic orientations is a complex phenomenon which is influenced by the substrate, sputtering conditions, and mechanical stresses in the film. This texturing effect has been reported for various metal oxide films prepared by magnetron sputtering, [21][22][23] but a mechanistic understanding of the crystallographic orientation observed here is beyond the scope of this study. The Li 2 MoO 3 thin film's structure was also analyzed using Raman spectroscopy as shown in Figure 2b.…”

Section: Resultssupporting

confidence: 70%

Structural and Electrochemical Characterization of Thin Film Li₂MoO₃ Electrodes

Self¹,

Zhang²,

Kercher³

et al. 2019

J. Electrochem. Soc.

View full text Add to dashboard Cite

Li2MoO3 is a promising structural stabilizing unit for use in composite layered-layered cathodes for Li-ion batteries. To enable the rational design of such cathodes, studies on fundamental phenomena related to the active material structure and electrode/electrolyte interface are needed. The present work details the fabrication and characterization of thin film Li2MoO3 cathodes and shows that their electrochemical performance greatly depends on the nature of the cathode/electrolyte interface. The Li2MoO3 thin films exhibit poor cyclability in a liquid carbonate electrolyte (e.g., initial capacity of 166 mAh/g with 40% capacity fade over 20 cycles) whereas all-solid-state Li2MoO3/Lipon/Li batteries show negligible fade during cycling. A suite of characterization methods including Raman spectroscopy and X-ray photoelectron spectroscopy are used to study the evolution of the cathode structure and cathode electrolyte interphase (CEI) layer during charge/discharge cycling. Li transport rates are another important factor which affect cathode performance. AC impedance spectroscopy studies reveal that the Li diffusion coefficient (DLi) in Li2MoO3 decreases from 4.36 × 10−11 cm2/s in the fully discharged state to 4.51 × 10−13 cm2/s when charged to 3.6 V vs. Li/Li+. Overall, the results presented herein provide insight on the fundamental phenomena which govern Li2MoO3 cathode performance.

show abstract

Section: Resultssupporting

confidence: 70%

Structural and Electrochemical Characterization of Thin Film Li₂MoO₃ Electrodes

Self¹,

Zhang²,

Kercher³

et al. 2019

J. Electrochem. Soc.

View full text Add to dashboard Cite

show abstract

“…At high sputter pressure of 8 Pa, deposition rate was decreased to 2.6 nm/min due to the mean free path of the atoms in the chamber decreased due to more collisions of the sputtered species occurred. When the sputtered particles transport from the target to substrate, some of the sputtered particles are reflected back hence decrease in the deposition rate of the films [27].…”

Section: Resultsmentioning

confidence: 99%

Sputter power and sputter pressure influenced structural and optical behaviour of RF sputtered nanocrystalline ZnO films

Reddy

Radhakrishna³

et al. 2012

Cryst. Res. Technol.

Self Cite

View full text Add to dashboard Cite

Zinc oxide thin films were deposited on p-type (100) silicon and Corning glass substrate by using RF magnetron sputtering at different sputter powers range 100 -200 W and sputter pressures range 2 -8 Pa. The deposited films were characterized by X-ray diffraction, atomic force microscopy, scanning electron microscopy, Fourier transform infrared spectroscope and UV-Vis-NIR spectrophotometer. The films formed at sputter power of 100 W consists of weak (100) reflection and then sputter power increased to 150 W additional (110) reflection was present with enhancement in the intensity of (100) peak. Further increase of sputtering power to 200 W the intensity of (100) phase decreased with the presence of additional peaks of (002) and (101) of ZnO. The FTIR analysis confirms the Zn-O absorption band was located at 414 cm −1 . The optical band gap of zinc oxide films decreased from 3.28 to 3.07 eV with increase of sputter power from 100 to 200 W. The maximum crystallite size of 21 nm, the root mean square roughness of 7.2 nm was found at films formed at working pressure of 5 Pa. The optical transmittance of the films increased from 88 to 96% and then decreased to 84% with increase of sputter pressure from 2 to 8 Pa.

show abstract

“…It is important to know that the preparation technique can define the electrical and optical properties of the films [4]. Various methods such as evaporation [5][6][7], chemical vapor deposition [8], sputtering [9][10][11][12][13], thermal oxidation [14], sol-gel process [15], were used to produce the copper oxide film. The advantages of sputtering method are its flexibility, scalability, complexity of possible films, reproducibility, ability to work at low temperature, capability to deposit precisely controlled hetero structures, and simplicity of controlling the film composition, structure and morphology.…”

Section: Introductionmentioning

confidence: 99%

Role of Ar/O2 mixture on structural, compositional and optical properties of thin copper oxide films deposited by DC magnetron sputtering

Aghilizadeh

Sari

2017

J Theor Appl Phys

View full text Add to dashboard Cite

In this study, the effect of oxygen content on a thin copper oxide layer deposited on BK7 and steel substrates by DC magnetron sputtering were investigated. Argon as working gas with impurity of 99.9% and various oxygen ratios were used to sputter a pure Cu cathode target in a cylindrical geometry. The produced samples were analyzed by X-ray diffraction (XRD), energy-dispersive X-ray (EDX), atomic force microscopy (AFM), and spectrophotometry techniques. The films thickness was measured by profilometer facility. The results show that by increasing oxygen content in the working gas the sputtering rate reduces. Moreover, the type of oxide phase (Cu 2 O or CuO) in the synthesized layer and consequently its optical properties dramatically depend on Ar/O 2 ratio in the working gas.

show abstract

Influence of substrate bias voltage on the properties of magnetron sputtered Cu2O films

Cited by 20 publications

References 20 publications

Structural and Electrochemical Characterization of Thin Film Li₂MoO₃ Electrodes

Structural and Electrochemical Characterization of Thin Film Li₂MoO₃ Electrodes

Sputter power and sputter pressure influenced structural and optical behaviour of RF sputtered nanocrystalline ZnO films

Role of Ar/O2 mixture on structural, compositional and optical properties of thin copper oxide films deposited by DC magnetron sputtering

Contact Info

Product

Resources

About

Influence of substrate bias voltage on the properties of magnetron sputtered Cu2O films

Cited by 20 publications

References 20 publications

Structural and Electrochemical Characterization of Thin Film Li2MoO3 Electrodes

Structural and Electrochemical Characterization of Thin Film Li2MoO3 Electrodes

Sputter power and sputter pressure influenced structural and optical behaviour of RF sputtered nanocrystalline ZnO films

Role of Ar/O2 mixture on structural, compositional and optical properties of thin copper oxide films deposited by DC magnetron sputtering

Contact Info

Product

Resources

About

Structural and Electrochemical Characterization of Thin Film Li₂MoO₃ Electrodes

Structural and Electrochemical Characterization of Thin Film Li₂MoO₃ Electrodes