Influence of Substrate Temperature on the Structural, Electrical and Optical Properties of Al-Doped ZnO Films by RF Magnetron Sputtering

Abstract

Transparent conducting aluminum-doped zinc oxide (AZO) films have been prepared on soda-lime glass substrates by radio frequency magnetron sputtering using a high density ceramic target at different substrate temperatures. The structural, morphology, electrical, and optical properties of the AZO thin films were investigated by X-ray diffraction, scanning electron microscope, Hall measurement, and optical transmission spectroscopy, and which were strongly influenced by substrate temperatures. Films with better texture, higher transmission, lower resistivity and larger carrier concentration were obtained for the samples fabricated at higher substrate temperature. The AZO film with the lowest resistivity of 4.63×10−4 Ω.cm and an average optical transmission of 92% in the visible range was deposited on the substrate heated at 450 °C. The optical bandgap depends on the deposition condition, and was in the range of 3.35~3.59 eV.

Structure transformation of ZnO thin films properties influenced by substrate temperature deposited by magnetron sputtering

“…The denser structure acts as the barrier for electron transports [7]. The conductivity can be improved by increased in donors, improved crystallinity and decrease the grain boundary scattering [8]. Fig.…”