2020
DOI: 10.1038/s41598-020-67589-z
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Influence of surface defect density on the ultrafast hot carrier relaxation and transport in $${\hbox {Cu}}_2 {\hbox {O}}$$ photoelectrodes

Abstract: Cuprous oxide (Cu 2 O) is a promising material for photoelectrochemical energy conversion due to its small direct band gap, high absorbance, and its Earth-abundant constituents. High conversion efficiencies require transport of photoexcited charges to the interface without energy loss. We studied the electron dynamics in Cu 2 O(111) by time-resolved two-photon photoemission for different surface defect densities in order to elucidate the influence on charge carrier transport. On the pristine bulk terminated su… Show more

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Cited by 20 publications
(13 citation statements)
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“…An interesting approach toward favorable charge transport processes follows the introduction of oxygen vacancies (V O ) within the material, ,− as desired properties of the substrate, such as toxicity and biocompatibility, are not drastically changed with partial reduction/oxidization. , V O are some of the most common reactive defect sites in MOSs, considerably impacting material properties even in a few ppm . Nevertheless, the role vacancies play in photocatalytic behavior of MOSs remains unclear in the literature, with contradictory results over their beneficial or detrimental impact. ,,,, The presence of V O has been suggested to enhance electron donor density, improving charge carrier transport. , Local charge induced by defects can greatly influence carrier transport . Furthermore, V O create electron/hole donor levels within the MOS band gap, promoting light adsorption and charge carrier photogeneration. , On the other hand, V O can act as recombination centers, impacting photocatalytic efficiency…”
mentioning
confidence: 99%
“…An interesting approach toward favorable charge transport processes follows the introduction of oxygen vacancies (V O ) within the material, ,− as desired properties of the substrate, such as toxicity and biocompatibility, are not drastically changed with partial reduction/oxidization. , V O are some of the most common reactive defect sites in MOSs, considerably impacting material properties even in a few ppm . Nevertheless, the role vacancies play in photocatalytic behavior of MOSs remains unclear in the literature, with contradictory results over their beneficial or detrimental impact. ,,,, The presence of V O has been suggested to enhance electron donor density, improving charge carrier transport. , Local charge induced by defects can greatly influence carrier transport . Furthermore, V O create electron/hole donor levels within the MOS band gap, promoting light adsorption and charge carrier photogeneration. , On the other hand, V O can act as recombination centers, impacting photocatalytic efficiency…”
mentioning
confidence: 99%
“…1(d). It was already successfully applied to study Cu 2 O photocathodes [18]. The probing depth of tr-2PPE is much more shallow than the light absorption length and the depth of the surface depletion region.…”
Section: Introductionmentioning
confidence: 99%
“…In Ref. [18], tr-2PPE measurements on Cu 2 O(111) single crystals are presented for different surface defect densities.…”
mentioning
confidence: 99%
“…[2] Different from highly efficient polycrystalline thin-film solar cells comprising rare or toxic constituent elements [such as gallium arsenide (GaAs), cadmium telluride (CdTe), and lead halide perovskite], [3][4][5] Cu 2 O is an earth-abundant nontoxic p-type semiconductor with a direct bandgap of ≈2 eV, which is more suitable for sustainable development of energy conversion. [6][7][8][9] However, Cu 2 O-based solar cells deliver far lower power conversion efficiencies (PCEs) than their Shockley-Queisser limit of ≈20% because of insufficient crystallization quality and misaligned energy levels. So far, several methods have been employed to fabricate polycrystalline Cu 2 O films, including thermal oxidation of copper foil, [10] electrodeposition, [1,11] sputtering, [12] chemical vapor deposition, [13] and pulsed laser deposition (PLD).…”
mentioning
confidence: 99%