2021
DOI: 10.1002/adfm.202110505
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Quasi‐Single Crystalline Cuprous Oxide Wafers via Stress‐Assisted Thermal Oxidation for Optoelectronic Devices

Abstract: P-type semiconductor cuprous oxide (Cu 2 O) offers promising optoelectronic applications such as solar cells and photodetectors owing to its considerable absorption coefficients and high carrier mobility. However, polycrystalline Cu 2 O films with low carrier mobility resulting from excessive grain boundaries and structure disorder fail to meet the demands for these optoelectronic applications. Here a stress-assisted thermal oxidation method to fabricate p-type <110>-textured quasi-single crystalline Cu 2 O (c… Show more

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Cited by 10 publications
(4 citation statements)
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“…3 demonstrated that while the emission spectra of various Cu 2 O samples were similar, the relative intensity of s-Cu 2 O-NF was higher compared to both s-Cu 2 O and s-Cu 2 O-NC under 450 nm illumination. This observation accounted for the gradual darkening of the sample color throughout the etching processes, indicating a consequent alteration in the band gap of the Cu 2 O sample 9,35 . These observations can be explained by three distinct stages in the crystal growth and etching process 24,36 : (1) the reaction of Cu 2+ and OH − leading to Cu(OH) 2 precipitation; (2) the addition of NH 2 OH•HCl accelerated the conversion of Cu(OH) 2 precipitates into Cu 2 O nanocrystals with trace Cl − incorporating into the crystal lattice 9 ; (3) morphology control by the ligandprotection/selective facet-etching strategy ensuring the predominant exposure of the {110} facets.…”
Section: Resultsmentioning
confidence: 95%
“…3 demonstrated that while the emission spectra of various Cu 2 O samples were similar, the relative intensity of s-Cu 2 O-NF was higher compared to both s-Cu 2 O and s-Cu 2 O-NC under 450 nm illumination. This observation accounted for the gradual darkening of the sample color throughout the etching processes, indicating a consequent alteration in the band gap of the Cu 2 O sample 9,35 . These observations can be explained by three distinct stages in the crystal growth and etching process 24,36 : (1) the reaction of Cu 2+ and OH − leading to Cu(OH) 2 precipitation; (2) the addition of NH 2 OH•HCl accelerated the conversion of Cu(OH) 2 precipitates into Cu 2 O nanocrystals with trace Cl − incorporating into the crystal lattice 9 ; (3) morphology control by the ligandprotection/selective facet-etching strategy ensuring the predominant exposure of the {110} facets.…”
Section: Resultsmentioning
confidence: 95%
“…On this basis, we drew a diagram of the energy-level arrangement. 16,37,38 As shown in Fig. 4j, the conduction band minimum of Ga 2 O 3 is located between those of Cu 2 O and ZnO, and the stepped energy band structure is conducive to charge transfer.…”
Section: Resultsmentioning
confidence: 96%
“…To gain further insight into the mechanism of the performance enhancement through the use of different architectures, we characterized the chargetransfer kinetics and charge recombination through the biased EQE spectra, electrochemical impedance spectroscopy (EIS), and capacitance-voltage (C-V) profiling. 37 Fig. 5d shows the ratio of EQE (À0.5 V) to EQE (0 V) as a function of the wavelength.…”
Section: Resultsmentioning
confidence: 99%
“…This should ensure that the carrier encounters as little scattering as possible by the defects during migration, thus increasing the carrier mobility. Besides, tracing back to the XRD and SEM information of Cu 2 O in Figure , ED-Cu 2 O has larger crystal grains than MS-Cu 2 O, which should help further alleviate the carrier scattering through grain boundaries, thereby enlarging the mobility, referring to Cu 2 O fabricated by the thermal oxidation method, which features a carrier mobility of 91 cm 2 V –1 s –1 with crystal grains up to a few micrometers and carrier density down to 1 × 10 13 cm –3 . , Thus, the carrier mobility of ED-Cu 2 O should be much greater than MS-Cu 2 O in theory. The experimental data, however, turn out to be the opposite.…”
Section: Resultsmentioning
confidence: 99%