2015
DOI: 10.1016/j.tsf.2015.05.029
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Influence of target power on properties of CuxO thin films prepared by reactive radio frequency magnetron sputtering

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Cited by 37 publications
(21 citation statements)
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“…The calculated optical E g values can be obtained as 2.51 ± 0.02 eV, 1.65 ± 0.1 eV, and 1.42 ± 0.01 eV for Cu 2 O, Cu 4 O 3 , and CuO, respectively. These are consistent with the previous reported results [2,4,7,12,15,28]. Furthermore, the measured results of the band gap indicate that, although the morphologies of the films under various O 2 partial pressures are different, the band gap value of each type of single-phase copper oxide remains almost constant.…”
Section: Resultssupporting
confidence: 92%
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“…The calculated optical E g values can be obtained as 2.51 ± 0.02 eV, 1.65 ± 0.1 eV, and 1.42 ± 0.01 eV for Cu 2 O, Cu 4 O 3 , and CuO, respectively. These are consistent with the previous reported results [2,4,7,12,15,28]. Furthermore, the measured results of the band gap indicate that, although the morphologies of the films under various O 2 partial pressures are different, the band gap value of each type of single-phase copper oxide remains almost constant.…”
Section: Resultssupporting
confidence: 92%
“…The transmittance and reflectance spectra for different copper oxides deposited under various total pressures are present in Figure 4. By using the Tauc relation, one can estimate the E g values from the transmittance and reflectance [12,28]:(αhυ)n=A(hυEg)  where hν is the incident photon energy, and A is a constant related to the materials. The magnitudes of n are considered to be 2, 1/2, 3, and 3/2 corresponding to allowed direct, allowed indirect, forbidden direct, and forbidden indirect transitions, respectively.…”
Section: Resultsmentioning
confidence: 99%
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“…The MSE of the fit for the as-grown and annealed Cu 2 O thin film was 7.9 and 10.0, respectively. Based on the measured transmittance spectra, a Tauc plot analysis was made to determine the optical band gap of the AZO and as-grown and annealed Cu 2 O thin films [22]. The analysis (data not shown) suggests that the optical band gap is increased from E g = 2.23 eV for the as-grown Cu 2 O film to E g = 2.38 eV after annealing.…”
Section: Refractive Index and Surface Morphologymentioning
confidence: 99%
“…Especially, Cu x O thin films are potential for photovoltaic applications, due to their good properties such as high absorption coefficient in the visible region, elemental abundance, non-toxicity and stability with the characteristicofbeing"ultra-low-cost".Their direct optical band gap energy is in the range of (2.1 to 2.6 eV) for Cu 2 O and (1.21 to 2.1 eV) for CuO [18][19][20][21][22]. Copper oxide thin films had been fabricated by various techniques such as electrodeposition [23], pulsed laser deposition [24], sol-gel technique [21], spay pyrolysis [25] …etc.…”
Section: Introductionmentioning
confidence: 99%