2016
DOI: 10.1063/1.4945948
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Influence of Te and Se doping on ZnO films growth by SILAR method

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Cited by 6 publications
(3 citation statements)
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“…For example, Lin et al 10 prepared nanotubes with different ratios of Te and Se/Te doped TiO 2 , and found that the absorption coefficient was considerably enhanced in the visible spectrum, and the absorption edge had a strong red shift. Güney and Duman 11 prepared ZnSeO and ZnTeO thin films by changing the doping ratios of Se and Te, and obtained a significant decrease from 3.37 eV (pure ZnO) to 2.26–2.60 eV. Liu et al 12 studied S-, Se- and Te-doped NaTaO 3 using the first-principles calculations, and obtained similar results for bandgap, in addition, the carrier mobility, and its difference between electrons and holes, was all significantly larger than that of pure NaTaO 3 , which could effectively reduce the recombination of electrons and holes.…”
Section: Introductionmentioning
confidence: 99%
“…For example, Lin et al 10 prepared nanotubes with different ratios of Te and Se/Te doped TiO 2 , and found that the absorption coefficient was considerably enhanced in the visible spectrum, and the absorption edge had a strong red shift. Güney and Duman 11 prepared ZnSeO and ZnTeO thin films by changing the doping ratios of Se and Te, and obtained a significant decrease from 3.37 eV (pure ZnO) to 2.26–2.60 eV. Liu et al 12 studied S-, Se- and Te-doped NaTaO 3 using the first-principles calculations, and obtained similar results for bandgap, in addition, the carrier mobility, and its difference between electrons and holes, was all significantly larger than that of pure NaTaO 3 , which could effectively reduce the recombination of electrons and holes.…”
Section: Introductionmentioning
confidence: 99%
“…These dopants cause variations in physical and optical properties for ZnO, after different treatments of oxygen and zinc. One of the suitable dopants is Tellurium (Te) [4]. Te is a group VIA (Oxygen, Sulphur, Selenium and Tellurium) chalcogen family element.…”
Section: Introductionmentioning
confidence: 99%
“…SILAR yönteminde katkılama yapmak için katkı yapılacak olan organik ya da inorganik madde katyonik ve anyonik çözelti içerisine katılarak gerçekleştirilebilmektedir. Diğer bir avantajı ise kolaylıkla üçlü hatta dörtlü bileşikler yapılabilmektedir [13]. En önemli farklılıklarından biri de taban malzeme tercihi olmayışı ve altlık boyutunun önemi olmayışıdır.…”
Section: Giriş (Introduction)unclassified