Influence of the pulse plasma chemical content on the crystallization of diamond under conditions of its thermodynamic instability

Sokołowski, M.

doi:10.1016/0022-0248(81)90507-8

Cited by 33 publications

(6 citation statements)

References 10 publications

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“…The Impulse Plasma Deposition (IPD) method of surface engineering has been developed [1,2] in the Faculty of Materials Science of Warsaw University of Technology in the early 1980s. The principle of IPD was based on the nucleation on plasma ions, when potential energy of homogeneously generated nuclei was due to inelastic collisions with electrons.…”

Section: Introductionmentioning

confidence: 99%

Computational Studies of the Impulse Plasma Deposition Method

Rabiński¹,

Zdunek²

2016

Plasma Science and Technology - Progress in Physical States and Chemical Reactions

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During the Impulse Plasma Deposition (IPD), plasma is generated in the working gas due to a high-voltage high-current discharge ignited within an inter-electrode region of a coaxial accelerator. The paper presents computational studies of working medium dynamics during the IPD discharge. The plasma has been investigated with a two-dimensional mono-fluidic snow plow model and a two-dimensional two-fluid magnetohydrodynamic code. Computational studies of plasma dynamics have shown the function of the snow plow mechanism during the acceleration of plasma discharge, the role of the Rayleigh-Taylor instability, and the details of a sophisticated structure of a plasmoid in the region of the electrodes' front head. Simulations have significantly increased the understanding of the phenomena during the IPD; they also pointed to optimization directions. Several recent developments in the IPD surface engineering have been suggested and supported by the presented computational investigations.

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Section: Introductionmentioning

confidence: 99%

Computational Studies of the Impulse Plasma Deposition Method

Rabiński¹,

Zdunek²

2016

Plasma Science and Technology - Progress in Physical States and Chemical Reactions

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“…The impulse plasma generated in a coaxial plasma accelerator, originally used only in fusion energy experiments, has found a wide variety of applications in environmentally conscious fields of surface engineering, in particular for deposition of thin films of metals [1,2], nitrides [3,4], oxides [4,5], borazone [6] and even diamond on material surfaces. The possibility of low-temperature growth of diamonds using the impulseplasma deposition method (IPD) has been demonstrated in publications from the authors of the IPD method [7,8]. For the source materials for the crystallization of diamond, they employed a graphite electrode of the plasma reactor or the electrode together with CH 4 passing through a generator.…”

Section: Introductionmentioning

confidence: 99%

“…Earlier studies on the products of the impulse plasma synthesis in a methane atmosphere showed that conditions prevailing at some distance from the accelerator outlet (in its off-axis region) were favorable for the process of diamond crystallization [8]. In the remaining regions of the deposition chamber, different graphites (cubic, chaoite, hexagonal) were crystallized.…”

Section: Introductionmentioning

confidence: 99%

Spatially resolved spectroscopy of an impulse plasma for thin film deposition

Kułakowska-Pawlak¹

2009

Plasma Sources Sci. Technol.

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Radially resolved emission measurements have been employed for a better understanding of plasma generated in a pulsed coaxial accelerator operating in a mixture of propane and butane under conditions which enable diamond-like layer deposition. The measurements were taken at two positions along the axis of symmetry of the discharge.Assuming the Boltzmann and Saha equilibrium, the emission from the plasma has been quantified. Abel-transformed radial profiles of the spectral lines of C I, C II and C III have been used to study radial changes in the concentration of excited neutral, singly and doubly ionized carbon, in the excitation temperature, in the ionization temperature and in the electron number density. Values of excitation and ionization temperatures and their radial profiles for a given axial position did not differ significantly. On the axis of symmetry of the discharge, the excitation temperature of C II and the electron density were found to reach values of about 29 000 K and 5 × 10 17 cm −3 , respectively.In addition, the relative densities of the C, C + and C 2+ species were evaluated, and hence the spatial inhomogeneous plasma structure with respect to the distribution of neutral and ionized fractions of carbon has been revealed and discussed in terms of deposition conditions.

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“…These products may react chemically, including the phase nucleation. In the IPD surface engineering plasma discharge is applied for synthetising the amorphous and nanostructured high-melting materials as thin layers deposited on different substrates [1,5]. Coatings made of a diamond, titanium nitride, multicomponent metallic alloys and aluminum oxide, adhere well to the substrates, although no external source heats them during the plasma process.…”

Section: Introductionmentioning

confidence: 99%