2019
DOI: 10.1088/1742-6596/1359/1/012109
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Influence of the substrate temperature on the jet diamond depositon

Abstract: The gas-jet diamond deposition with the activation of H2 + CH4 mixture by microwave discharge has been implemented. The maximum crystal size was observed at the substrate temperature of 850°C. The dependence of a film structure on the substrate temperature has been established. Diamond coating was received at a low substrate temperature (524°C).

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