2003
DOI: 10.1016/s0254-0584(02)00211-0
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Influence of thickness and substrate temperature on electrical and photoelectrical properties of vacuum-deposited CdSe thin films

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Cited by 170 publications
(37 citation statements)
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“…Which, in turn, depend on the increase of grain /particle size of the CdSe films with increasing substrate temperature, such observations have been reported for vacuum evaporated films [17]. A band gap variation in the range of 1.79 -1.62 eV was observed for the vacuum evaporated CdSe films [18] when the substrate temperature was increased from RT to 200 °C. A decrease of band gap from 2.30 to 1.90 eV was observed when the substrate temperature was increased from 0 °C to 85 °C for chemically deposited CdSe thin films [19].…”
Section: Methodssupporting
confidence: 51%
“…Which, in turn, depend on the increase of grain /particle size of the CdSe films with increasing substrate temperature, such observations have been reported for vacuum evaporated films [17]. A band gap variation in the range of 1.79 -1.62 eV was observed for the vacuum evaporated CdSe films [18] when the substrate temperature was increased from RT to 200 °C. A decrease of band gap from 2.30 to 1.90 eV was observed when the substrate temperature was increased from 0 °C to 85 °C for chemically deposited CdSe thin films [19].…”
Section: Methodssupporting
confidence: 51%
“…Above two regions have been attributed to transitions from a sub band of the valence band to the conduction band. A similar type of variation was also observed by H.A Zayed et al [39] and D.Pathinettam Padiyan et al [40]. In sample with x=0 ml and 10 ml, the plots shown in Fig.2a and 2b exhibits Arrhenius behavior in two different temperature regions (i) (77-125 K) and (ii) (125-300 K).…”
Section: Results and Discussion 31 X-ray Diffraction Studiessupporting
confidence: 86%
“…Electrolytic deposition [10], spray pyrolysis [11] and vacuum evaporation [12] techniques have been employed for deposition of CdSnSe thin films so far. The thin film growth conditions and thermal annealing process were found effective to achieve the performance devices [13][14][15].…”
Section: Introductionmentioning
confidence: 99%