Influence of Ti film thickness and oxidation temperature on TiO2 thin film formation via thermal oxidation of sputtered Ti film

The Influence of Titanium-Niobium Alloys on the Growth of the Oxide Layer

“…Subsequently, the samples were oxidized. The type of oxidation process and its parameters were based on the literature [7,9,10]: oxidation at temperature of 600°C in the air atmosphere at atmospheric pressure with dwell of 8 hours in the LAC LH 30/13 furnace equipped with MT825-A regulator. The course of the oxidation was following: heating from the room temperature with speed of 7.5°C/min up to required 600°C.…”

Photocatalytic performance of Pd decorated TiO2–CdO composite: Role of in situ formed CdS in the photocatalytic activity

“…TC50 consists of anatase phase of TiO 2 and cubic phase of CdO indicating that it is a composite. Raman spectrum of pure TiO 2 shows bands with Raman shifts at 144, 395, 517 and 639 cm À1 corresponding to Raman modes of E g , B 1g , A 1g and E g , respectively, which are characteristic of anatase phase of TiO 2 [24]. Raman spectrum of CdO shows a broad vibrational band in the region, 200e500 cm À1 centered around 285 cm À1 , which is characteristic of CdO [25].…”

Composition and properties of RF-sputter deposited titanium dioxide thin films

“…The films deposited through this method are commonly dense, closed layers of nanoparticulate TiO 2 . Nanoparticle Titania has shown particular promise across the range of possible applications and also offers a level of control over characteristics such as particle size [16], phase-type [17,18] and stoichiometry [17].…”