Influences of carbon content and power density on the uniformity of PECVD grown a-Si1−x:Cx:H thin films

Optical and Structural Properties of a-SiC:H prepared by Hot-wire CVD Technique at Various Gas Flow

“…Among the popular technique being used are Plasma Enhanced CVD [4][5][6], ECR-Plasma enhanced CVD [7], Sputtering [8] and also HW-CVD [9][10][11]. The present study investigates optical and structural properties of aSiC:H films prepared at various methane to silane gas flow rate ratio using a HW-CVD system.…”