2007
DOI: 10.1007/s10854-006-9101-8
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Infrared absorption spectra of defects in carbon doped neutron-irradiated Si

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Cited by 8 publications
(6 citation statements)
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“…Also carbon atoms emanated from precipitates contribute to the increase of the carbonrelated bands. Similar arguments could be put forward for the bands related to interstitial clusters, as for example, the 533 cm À1 band which has been tentatively attributed 48 to a self-interstitial cluster and which appear stronger in the spectra of the initially heat-treated samples. In the latter samples, oxygen precipitates are expected to form.…”
Section: -3supporting
confidence: 59%
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“…Also carbon atoms emanated from precipitates contribute to the increase of the carbonrelated bands. Similar arguments could be put forward for the bands related to interstitial clusters, as for example, the 533 cm À1 band which has been tentatively attributed 48 to a self-interstitial cluster and which appear stronger in the spectra of the initially heat-treated samples. In the latter samples, oxygen precipitates are expected to form.…”
Section: -3supporting
confidence: 59%
“…For example, the 527 cm À1 band has been attributed 47 to the C s C s defect. The 533 cm À1 band has been argued, 48 on the basis of its thermal stability, that has the same origin as the Si-P6 EPR spectrum tentatively correlated 6 with the Si di-interstitial. The band at 544 cm À1 is a complex one arising 48 from the correlation of two bands at 543.5 and 545.5 cm À1 attributed to the C i C s and C i O i defects, correspondingly.…”
Section: Introductionmentioning
confidence: 94%
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“…2,25,26 Recent investigations have determined the 544 cm À1 band to be a contribution of two bands from the C i O i and C i C s pairs. 27 The C i C s pair anneals out at about 250 C. 2,26 On heavier doses, the C i , C i O i and C i C s pairs act as nucleation sites for self-interstitials leading to the formation of C i (Si I ), C i O i (Si I ), and C i C s (Si I ) complexes. 2,28 It has been reported that the annealing temperature of VO defect decreases with the increase of Ge content of Gedoped Cz-Si, although the annealing temperatures of the C i O i and C i C s pairs are practically unaffected.…”
mentioning
confidence: 99%