Infrared Spectroscopic Ellipsometry

Röseler, A.; Korte, Ernst‐Heiner

doi:10.1002/0470027320.s2208

Cited by 72 publications

(59 citation statements)

References 55 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Ellipsometric measurements were performed on all samples (Figure 3). A polarization degree larger than 95% was measured over the entire visible spectrum,53 thus confirming that (i) in spite of their nanoporous morphology, our hybrid films can be considered as homogeneous with regard to their macroscopic optical properties, and (ii) no depolarization effects are introduced by the residual surface roughness [Figure 1(d)] and the consequent moderate light scattering [Figure 2(b)]. Therefore, in order to fit the ellipsometric spectra, we adopted a standard multi‐layer model that includes an effective layer mimicking the contribution of the surface roughness [Figure 1(d)].…”

Section: Resultsmentioning

confidence: 99%

Nanoporous Films with Low Refractive Index for Large‐Surface Broad‐Band Anti‐Reflection Coatings

Wicht

Ferrini

Schüttel³

et al. 2010

Macro Materials & Eng

View full text Add to dashboard Cite

Nowadays, nanoporous films are widely employed in biochemical applications or in opto‐photonic devices such as displays, solar cells, or light‐guiding systems. In particular, the technological feasibility of nanoporous layers with low refractive indices has recently enabled the development of high‐efficiency anti‐reflection coatings. In this paper, we report on hybrid polymer nanoporous films that can be fabricated in a single coating step with an industrial aqueous‐based method on very large surfaces. Both high transparency and low refractive index are simultaneously achieved over the entire visible spectrum. We eventually demonstrate the potential of such films for broadband AR applications by combining them in a graded‐index multilayer that reduces the surface reflectivity of a polymer substrate from 10% to few ‰.

show abstract

Section: Resultsmentioning

confidence: 99%

Nanoporous Films with Low Refractive Index for Large‐Surface Broad‐Band Anti‐Reflection Coatings

Wicht

Ferrini

Schüttel³

et al. 2010

Macro Materials & Eng

View full text Add to dashboard Cite

show abstract

“…Multiple books and reviews describe ellipsometry in great details. [33][34][35][36][37][38][39][40] In this section, we will summarize and explain only the basic concepts of RAE and MM-SE that are essential for understanding of the new instrument design and operations.…”

Section: Basics Of the Rae And Mm-se Techniquesmentioning

confidence: 99%

Synchrotron radiation-based far-infrared spectroscopic ellipsometer with full Mueller-matrix capability

Stanislavchuk

Kang

Rogers

et al. 2013

Review of Scientific Instruments

View full text Add to dashboard Cite

We developed far-IR spectroscopic ellipsometer at the U4IR beamline of the National Synchrotron Light Source in Brookhaven National Laboratory. This ellipsometer is able to measure both, rotating analyzer and full-Mueller matrix spectra using rotating retarders, and wire-grid linear polarizers. We utilize exceptional brightness of synchrotron radiation in the broad spectral range between about 20 and 4000 cm(-1). Fourier-transform infrared (FT-IR) spectrometer is used for multi-wavelength data acquisition. The sample stage has temperature variation between 4.2 and 450 K, wide range of θ-2θ angular rotation, χ tilt angle adjustment, and X-Y-Z translation. A LabVIEW-based software controls the motors, sample temperature, and FT-IR spectrometer and also allows to run fully automated experiments with pre-programmed measurement schedules. Data analysis is based on Berreman's 4 × 4 propagation matrix formalism to calculate the Mueller matrix parameters of anisotropic samples with magnetic permeability μ ≠ 1. A nonlinear regression of the rotating analyzer ellipsometry and∕or Mueller matrix (MM) spectra, which are usually acquired at variable angles of incidence and sample crystallographic orientations, allows extraction of dielectric constant and magnetic permeability tensors for bulk and thin-film samples. Applications of this ellipsometer setup for multiferroic and ferrimagnetic materials with μ ≠ 1 are illustrated with experimental results and simulations for TbMnO3 and Dy3Fe5O12 single crystals. We demonstrate how magnetic and electric dipoles, such as magnons and phonons, can be distinguished from a single MM measurement without adducing any modeling arguments. The parameters of magnetoelectric components of electromagnon excitations are determined using MM spectra of TbMnO3.

show abstract

“…The ellipsometric angles ψ and Δ were measured with a Sentech SE 850 spectroscopic ellipsometer in the spectral range of 300–2 300 nm at various reflection angles (55–70°). The wavelength‐dependent optical constants n ( λ ) and k ( λ ) were derived by means of a Levenberg‐Marquardt algorithm for minimizing the RMSE between the simulated curves and the measured data, as described, e.g., in Röseler . The homogeneity of the layer thickness on the ellipsometer measuring spot was verified with a FilMetrics F20‐UV reflectometer (200–1 100 nm) with a spot size of 1.5 mm.…”

Section: Methodsmentioning

confidence: 99%

Nanocrystalline Low‐Refractive Magnesium Fluoride Films Deposited by Reactive Magnetron Sputtering: Optical and Structural Properties

et al. 2015

View full text Add to dashboard Cite

In this work, we study MgF 2 thin-film synthesis by reactive pulsed DC magnetron sputtering from a metallic magnesium target in a gas mixture of argon, oxygen, and carbon tetrafluoride (CF 4 ). Nanocrystalline films on silicon and glass substrates with excellent properties for optical application are achieved. The plasma discharge is analyzed with a differentially pumped mass spectrometer before and during the deposition process. Without breaking the vacuum, monochromatic photoelectron spectroscopy (XPS) is performed for in situ determination of the atomic C and O concentration. Film microstructure, topography, and thickness are investigated by electron microscopy (SEM and TEM), atomic force microscopy (AFM), and X-ray diffraction (XRD). The optical constants n and k are determined by spectroscopic ellipsometry and spectrophotometry: a consistent parametric fit of the ellipsometric angles and spectral transmittance and reflectance based on three Lorentz oscillators to determine n and k is achieved for a wide spectral range (300-2 300 nm). At 550 nm, a refractive index of 1.382 and near-zero absorption is obtained, which is in excellent agreement with n ¼ 1.383 of polycrystalline MgF 2 . The measured light reflection at 760 nm is reduced by 3% for a quarter-wave nanocrystalline MgF 2 coating on glass compared to the uncoated glass substrate.

show abstract

Infrared Spectroscopic Ellipsometry

Cited by 72 publications

References 55 publications

Nanoporous Films with Low Refractive Index for Large‐Surface Broad‐Band Anti‐Reflection Coatings

Nanoporous Films with Low Refractive Index for Large‐Surface Broad‐Band Anti‐Reflection Coatings

Synchrotron radiation-based far-infrared spectroscopic ellipsometer with full Mueller-matrix capability

Nanocrystalline Low‐Refractive Magnesium Fluoride Films Deposited by Reactive Magnetron Sputtering: Optical and Structural Properties

Contact Info

Product

Resources

About