Infrared studies of polymer blends containing a copolymer of tetrafluoroethylene and a hexafluoroisopropanol substituted vinyl ether

Guigley, Kevin S.; Feiring, Andrew E.; Painter, Paul C.; Coleman, Michael M.

doi:10.1081/mb-120003081

Cited by 3 publications

(1 citation statement)

References 14 publications

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“…One can barely discern a small shoulder on the high-energy side of the OH band (near 3,600 cm -1 ) that can be attributed to free hydroxyl groups, but most of the OH groups on the NBFOH monomers are clearly participating in hydrogen bonds. This shoulder vanishes with increasing t-BA content, suggesting that the C=O group in the acrylate can serve as a hydrogen bond acceptor for the fluoroalcohol 15 .…”

Section: Ir Spectrum and End Group Absorbancementioning

confidence: 87%

Single layer fluropolymer resists for 157-nm lithography

Crawford

Farnham

Feiring

et al. 2003

Advances in Resist Technology and Processing XX

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We have developed a family of 157 nm resists that utilize fluorinated terpolymer resins composed of 1) tetrafluoroethylene (TFE), 2) a norbornene fluoroalcohol (NBFOH), and 3) t-butyl acrylate (t-BA). TFE incorporation reduces optical absorbance at 157 nm, while the presence of a norbornene functionalized with hexafluoroisopropanol groups contributes to aqueous base (developer) solubility and etch resistance. The t-butyl acrylate is the acid-catalyzed deprotection switch that provides the necessary contrast for high resolution 157 nm imaging. 157 nm optical absorbances of these resists depend strongly upon the amount of t-BA in the polymers, with the TFE/NBFOH dipolymers (which do not contain t-BA) exhibiting an absorbance lower than 0.6 µm -1 . The presence of greater amounts of t-BA increases the absorbance, but also enhances the dissolution rate of the polymer after deprotection, yielding higher resist contrast. Formulated resists based upon these fluorinated terpolymer resins have been imaged at International Sematech, using the 157 nm Exitech microstepper with either 0.6 NA or 0.85 NA optics. We have carefully explored the relationship between imaging performance, resist contrast, optical absorbance, and t-BA content of these terpolymer resist resins, and describe those results in this contribution.

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Section: Ir Spectrum and End Group Absorbancementioning

confidence: 87%

Single layer fluropolymer resists for 157-nm lithography

Crawford

Farnham

Feiring

et al. 2003

Advances in Resist Technology and Processing XX

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Interactions in a blend of two polymers greatly differing in glass transition temperature

Kratochvíl

Šturcová

Sikora

et al. 2011

J Polym Sci B Polym Phys

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Blends of poly(N‐methyldodecano‐12‐lactam) PMDL with poly(4‐vinyphenol) PVPh have been studied by the DSC and ATR FTIR methods. The difference in glass transition temperature Tg between the components is 206 °C. A single composition‐dependent Tg suggests miscibility of the system, that is, homogeneity on the scale of about 10 nm. Fitting of the equation of Brostow et al. to the Tg data indicates relatively strong specific interactions and high complexity of the system. The Schneider's equation applied separately to low‐ and high‐PVPh regions provides good agreement with experiment; the calculated curves cross at the point of PVPh weight fraction 0.27. In the low‐PVPh region, the analysis indicates weak interactions with predominance of segment homocontacts and strong involvement of conformational entropy. In the high‐PVPh region, strong specific interactions predominate and entropic effects are suppressed. Composition dependences of the heat capacity difference at Tg and the width of glass transition indicate strong interactions in the system and existence of certain heterogeneities on segmental level, respectively. According to ATR FTIR, hydrogen bonds between PVPh as proton donor and PMDL as proton acceptor induce miscibility in blends of higher PVPh content (above about 0.28 weight fraction). In low‐PVPh blends, it is conformational entropy that enables intimate intermolecular mixing. Hydrogen bonds adopt several (distorted) geometries and are on average stronger than average hydrogen bonds formed in self‐associating PVPh. © 2011 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys, 2011

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Miscible Polymer Blends

Goh

2014

Polymer Blends Handbook

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Infrared studies of polymer blends containing a copolymer of tetrafluoroethylene and a hexafluoroisopropanol substituted vinyl ether

Cited by 3 publications

References 14 publications

Single layer fluropolymer resists for 157-nm lithography

Single layer fluropolymer resists for 157-nm lithography

Interactions in a blend of two polymers greatly differing in glass transition temperature

Miscible Polymer Blends

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