2018
DOI: 10.1016/j.jcrysgro.2018.05.015
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Insight and control of the chemical vapor deposition growth parameters and morphological characteristics of graphene/Mo 2 C heterostructures over liquid catalyst

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Cited by 47 publications
(42 citation statements)
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“…With respect to this, studies 13,20 agree that Mo 2 C crystals get thinner with increasing thickness of Cu layer. Secondly, CH 4 flow rate is also very critical not only because it is the carbon source in Mo 2 C, but also the excess amount results in the formation of graphene, which may act as an additional diffusion barrier in the supply of Mo atoms 17 . Although various groups have mentioned simultaneous growth of graphene and Mo 2 C, there are conflicts in the positional relationship between graphene and Mo 2 C as well as their formation mechanism 14‐17,24 .…”
Section: Introductionmentioning
confidence: 99%
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“…With respect to this, studies 13,20 agree that Mo 2 C crystals get thinner with increasing thickness of Cu layer. Secondly, CH 4 flow rate is also very critical not only because it is the carbon source in Mo 2 C, but also the excess amount results in the formation of graphene, which may act as an additional diffusion barrier in the supply of Mo atoms 17 . Although various groups have mentioned simultaneous growth of graphene and Mo 2 C, there are conflicts in the positional relationship between graphene and Mo 2 C as well as their formation mechanism 14‐17,24 .…”
Section: Introductionmentioning
confidence: 99%
“…CVD has been a promising technique to achieve large area and high quality thin layers of Mo 2 C 3,13,22,[14][15][16][17][18][19][20][21] . In this method, Cu foil is placed on a Mo substrate and heated.…”
Section: Introductionmentioning
confidence: 99%
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“…With the purpose of controlling the morphology of the crystals, various groups have successfully studied the effects of various processing parameters such as the thickness of Cu foil [7][8][9] , CH4:H2 ratio 6,8,[10][11][12][13] , and duration 6,8,[10][11][12]14 . Although temperature is a very critical processing parameter, in this process the choice of temperature is very limited (above 1085 C) because Cu must be in the liquid state to allow the diffusion of Mo atoms through Cu towards the surface.…”
Section: Results Is the Formation Of 2mo + C  Mo2cmentioning
confidence: 99%