Insights on the deposition mechanism of sputtered amorphous carbon films

Logothetidis, S.; Gioti, M.; Patsalas, P.; Charitidis, Costas A.

doi:10.1016/s0008-6223(98)00268-1

Cited by 72 publications

(42 citation statements)

References 26 publications

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“…It is seen that in the case of HiPIMS deposited films, an increase of V b up to a value of 50 V results in an increase of the sp 3 content in the films followed by a decrease at larger V b values. This trend is in qualitative agreement with results obtained by other PVD techniques, such as PLD [41], FCA [42] and rfMS [16] which are reproduced for reference in Fig. 3.…”

Section: Film Propertiessupporting

confidence: 91%

“…Comparison of the mass density and sp 3 fractions measured in amorphous carbon films grown by rfMS (Ref. [16], hollow squares), FCA (Ref. [42], hollow circles), and PLD (Ref.…”

Section: Discussionmentioning

confidence: 99%

“…[41], hollow triangles) as a function of the substrate bias voltage (dc voltage for Ref. [16]) or the incident ion energy (Refs. [41] and [42]) are reproduced for reference.…”

Section: Discussionmentioning

confidence: 99%

“…In Fig. 5, published density values for hydrogenated and nonhydrogenated a-C films deposited using a variety of physical and chemical vapor deposition techniques [12,16,[43][44][45][46][47] are plotted as function of the sp 3 content.…”

Section: Film Propertiesmentioning

confidence: 99%

“…This, in the case of amorphous carbon films, has been shown to lead to the growth of films with sp 3 bond fractions significantly lower than those achieved by FCA and PLD, e.g. up to 45% in rfMS [16].…”

Section: Introductionmentioning

confidence: 99%

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Exploring the potential of high power impulse magnetron sputtering for growth of diamond-like carbon films

Sarakinos

Braun

Zilkens

et al. 2012

Surface and Coatings Technology

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Amorphous carbon films are deposited employing high power impulse magnetron sputtering (HiPIMS) at pulsing frequencies of 250 Hz and 1 kHz. Films are also deposited by direct current magnetron sputtering (dcMS), for reference. In both HiPIMS and dcMS cases, unipolar pulsed negative bias voltages up to 150 V are applied to the substrate to tune the energy of the positively charged ions that bombard the growing film. Plasma analysis reveals that HiPIMS leads to generation of a larger number of ions with larger average energies, as compared 2 to dcMS. At the same time, the plasma composition is not affected, with Ar + ions being the dominant ionized species at all deposition conditions. Analysis of the film properties shows that HiPIMS allows for growth of amorphous carbon films with sp 3 bond fraction up to 45% and density up to 2.2 gcm -3 . The corresponding values achieved by dcMS are 30% and 2.05 gcm -3 , respectively. The larger fraction of sp 3 bonds and mass density found in films grown by HiPIMS are explained in light of the more intense ion irradiation provided by the HiPIMS discharge as compared to the dcMS one.

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Section: Film Propertiessupporting

confidence: 91%

“…Comparison of the mass density and sp 3 fractions measured in amorphous carbon films grown by rfMS (Ref. [16], hollow squares), FCA (Ref. [42], hollow circles), and PLD (Ref.…”

Section: Discussionmentioning

confidence: 99%

“…[41], hollow triangles) as a function of the substrate bias voltage (dc voltage for Ref. [16]) or the incident ion energy (Refs. [41] and [42]) are reproduced for reference.…”

Section: Discussionmentioning

confidence: 99%

Section: Film Propertiesmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Exploring the potential of high power impulse magnetron sputtering for growth of diamond-like carbon films

Sarakinos

Braun

Zilkens

et al. 2012

Surface and Coatings Technology

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Precursors for CVD Growth of Nanocrystalline Diamond

2004

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Variuos routes to grow nanocrystalline diamond films by chemical vapor deposition technique are reviewed. Among various routes, NCD films deposited on mirror polished silicon substrates by biased enhanced growth by microwave plasma chemical vapor deposition are described in detail. Qualitative concentration of NCD was assessed by Raman spectroscopy and X-ray diffraction patterns of the films. The hardness of the films approaches to that of natural diamond at optimized conditions while still having low amount of stress (< 1 GPa).

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Nucleation and growth of CVD diamond on fused silica optical fibres with titanium dioxide interlayer

Bogdanowicz

Śmietana

Gnyba

et al. 2013

Physica Status Solidi (a)

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Nucleation and growth processes of thin diamond films on fused silica optical fibres have been investigated. Fibres were coated with diamond film using microwave plasma enhanced chemical vapour deposition (mPE CVD) system. Since the growth of diamond on the fused silica glass requires high seeding density, two types of glass pre-treatment were applied: titanium dioxide (TiO 2 ) interlayer deposition and sonication in nanodiamond suspension. In the experiment, high density, thin ($20 nm) TiO 2 films were deposited using high-power impulse magnetron sputtering. Subsequently, a set of thin diamond films deposited in up to 60 min-long process was investigated. Results obtained for the two pre-treatment methods were compared. The nucleation processes were studied and compared using numerical analysis of scanning electron microscopy (SEM) images. The molecular structure of nucleated diamond was examined with micro-Raman spectroscopy. The sp 3 /sp 2 ratio was calculated using Raman spectra deconvolution method. Thickness, roughness and optical properties of the nanodiamond films in VIS-NIR wavelength range were investigated by means of spectroscopic ellipsometry. It was found that the high density TiO 2 interlayer enhances CVD diamond film nucleation processes on fused silica and increases sp 3 /sp 2 ratio of the film. The proposed growth method can be effectively applied in manufacturing of various types of optical fibre sensors. Due to high chemical and mechanical resistance of the diamond films such optical sensors are highly desired.

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Insights on the deposition mechanism of sputtered amorphous carbon films

Cited by 72 publications

References 26 publications

Exploring the potential of high power impulse magnetron sputtering for growth of diamond-like carbon films

Exploring the potential of high power impulse magnetron sputtering for growth of diamond-like carbon films

Precursors for CVD Growth of Nanocrystalline Diamond

Nucleation and growth of CVD diamond on fused silica optical fibres with titanium dioxide interlayer

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