Instability of the reactive magnetron sputtering process

Burmakov, A. P.; Зайков, В. А.; Labuda, Aleksander; Chernyi, Vitaliy

doi:10.1007/bf02606262

Cited by 2 publications

(3 citation statements)

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“…Figure 1 shows spectra for discharge power 1.5 kW and working-gas pressure 0.4 Pa. Intensities of several spectral control elements (SCE) are given as functions of the stage of process reactivity. The stage of process reactivity takes values from zero to unity and can act as a criterion for the quality of the film deposition of the required composition [8]. An increase of the stage of reactivity corresponds to an increase of the oxygen content in the deposited coating.…”

Section: Resultsmentioning

confidence: 99%

“…The use of optical-spectral flow controllers for gases [1][2][3] in magnetron deposition of oxides causes technical difficulties with the recording of the intensity of oxygen spectral lines using optical sensors in light filters. A narrow-band interference light filter with a transmission half-width of less than 1.5 nm and a low transmission beyond the limits of the operating range is required to identify the strongest line OI at 777.3 nm because this line lies very close to bright argon lines, the main component of the working gas.…”

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Spectroscopic system for controlling gas flow and impurity content during magnetron deposition of films

Burmakov

Kuleshov

2007

J Appl Spectrosc

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An automated system for controlling oxygen flow in vacuum-plasma magnetron deposition of oxides with simultaneous monitoring of gas impurities in a vacuum chamber is proposed. Features of using compact spectrometers in such a system are considered. The precision of controlling the flow of metal and oxygen particles during deposition of Ti and Al oxides is determined. The sensitivity to impurity content is estimated. The effect of sputtered metal and type of coating (metal or oxide) on the sensitivity to impurities of air, water vapor, and oil in the vacuum chamber is found.Introduction. The use of optical-spectral flow controllers for gases [1][2][3] in magnetron deposition of oxides causes technical difficulties with the recording of the intensity of oxygen spectral lines using optical sensors in light filters. A narrow-band interference light filter with a transmission half-width of less than 1.5 nm and a low transmission beyond the limits of the operating range is required to identify the strongest line OI at 777.3 nm because this line lies very close to bright argon lines, the main component of the working gas. The discharge power and pressure in the vacuum chamber must be very stable for controllers with a single-channel control algorithm to operate if the optical sensor records the intensity of spectral lines of the sputtered material [4]. Compact multi-channel radiation-spectrum recorders, for example, S100 and SL40-2 models of Solar [5, 6], and spectrometers of Ocean Optics [7] have been recently produced. These are of great interest for use in optical-spectral systems for controlling gas flow. This is due to the rather high-quality specifications of the spectrometers and their rather small size. Moreover, owing to the rapid recording of the spectrum (minimal recording time is 7 msec) and the spectral resolution, which is comparable with narrow-band interference light filters, they can also be used simultaneously to monitor the chemical purity of process plasma streams. Herein we propose a system for automated control of working gas flows in vacuum-plasma magnetron processes for depositing coatings of complicated chemical composition with simultaneous monitoring of gaseous impurities in the vacuum chamber. Features of using compact S100 and SL40-2 spectrometers in such a system as a multichannel sensor are examined using deposition of titanium and aluminum oxide films as an example. The capabilities of the system for simultaneous monitoring of oxygen, water, and oil impurities in the vacuum chamber are determined.Experimental. Experiments were conducted in a vacuum apparatus for magnetron sputtering that was equipped with a gas-flow controller [3] and devices for regulated admission to the vacuum chamber of oxygen, water vapor, and oil. We used a planar DC magnetron with discharge power of 1.0-1.5 kW and a vacuum-chamber pressure of 0.3-0.4 Pa. Oxygen flow during deposition of titanium and aluminum oxide films was controlled by a single-channel algorithm by identifying atomic spectral lines of sputtered ...

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Section: Resultsmentioning

confidence: 99%

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confidence: 99%

Spectroscopic system for controlling gas flow and impurity content during magnetron deposition of films

Burmakov

Kuleshov

2007

J Appl Spectrosc

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“…To work successfully in such a quick dropped transition region, a rapid reactive gas control system is required. PEM (plasma emission monitor) is the most commonly adopted method and can also be used in combination with other techniques if required [10,11]. Besides that, to precisely control metal nitrides' gradual change to oxy-nitrides and oxides (i.e., (Ti,Al)N, (Ti,Al)(NO), Al 2 O 3 ) is an arduous task.…”

Section: Introductionmentioning

confidence: 99%

Microstructure and Photothermal Conversion Performance of Ti/(Mo-TiAlN)/(Mo-TiAlON)/Al2O3 Selective Absorbing Film for Non-Vacuum High-Temperature Applications

Geng

Chen

et al. 2020

Applied Sciences

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This paper aims to clarify the phase composition in each sub-layer of tandem absorber TiMoAlON film and verify its thermal stability. The deposited multilayer Ti/(Mo-TiAlN)/(Mo-TiAlON)/Al2O3 films include an infrared reflectance layer, light interference absorptive layers with different metal doping amounts, and an anti-reflectance layer. The layer thicknesses of Ti, Mo-TiAlN, Mo-TiAlON, and Al2O3 are 100, 300, 200, and 80 nm, respectively. Al content increases to 12 at.% and the ratio of N/O is nearly 0.1, which means nitride continuously changes to oxide. According to X-ray Diffraction (XRD) and high-resolution transmission electron microscopy (HRTEM) results, the diffraction peak that appears at 2θ = 40° demonstrates that Mo element aggregates in the substitutional solid solution (Ti,Al)(O,N) columnar grain. TiMoAlON films have low reflectivity in the spectrum range of 300–900 nm. When Al content is more than 10 at.%, absorptivity is almost in the spectrum range from visible to infrared, but absorptivity decreases in the ultraviolet spectrum range. When Al content is increased to 12 at.%, absorptivity α decreases by 0.05 in the experimental conditions. After baking in atmosphere at 500 °C for 8 h, the film has the highest absorptivity when doped with 2 at.% Mo. In the visible-light range, α = 0.97, and in the whole ultraviolet-visible-light near-infrared spectrum range, α = 0.94, and emissivity ε = 0.02 at room temperature and ε = 0.10 at 500 °C.

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Instability of the reactive magnetron sputtering process

Cited by 2 publications

References 3 publications

Spectroscopic system for controlling gas flow and impurity content during magnetron deposition of films

Spectroscopic system for controlling gas flow and impurity content during magnetron deposition of films

Microstructure and Photothermal Conversion Performance of Ti/(Mo-TiAlN)/(Mo-TiAlON)/Al2O3 Selective Absorbing Film for Non-Vacuum High-Temperature Applications

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