2017
DOI: 10.1038/s41598-017-17937-3
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Insulator–metal transition in substrate-independent VO2 thin film for phase-change devices

Abstract: Vanadium has 11 oxide phases, with the binary VO2 presenting stimuli-dependent phase transitions that manifest as switchable electronic and optical features. An elevated temperature induces an insulator–to–metal transition (IMT) as the crystal reorients from a monoclinic state (insulator) to a tetragonal arrangement (metallic). This transition is accompanied by a simultaneous change in optical properties making VO2 a versatile optoelectronic material. However, its deployment in scalable devices suffers because… Show more

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Cited by 84 publications
(59 citation statements)
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“…After a couple of biasing cycles, a minor crystalline region is observed in the functional oxide. [19] This, to the best of our knowledge, is the first demonstration of a-VO 2 thin film crystallizing into localized c-VO 2 with electric bias. Here, the separation between fringes is 0.35 nm as shown in high resolution TEM (HRTEM) and FFT insets which corresponds to the (011) plane of VO 2 -M1 phase.…”
Section: Forming and Switching Mechanismmentioning
confidence: 64%
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“…After a couple of biasing cycles, a minor crystalline region is observed in the functional oxide. [19] This, to the best of our knowledge, is the first demonstration of a-VO 2 thin film crystallizing into localized c-VO 2 with electric bias. Here, the separation between fringes is 0.35 nm as shown in high resolution TEM (HRTEM) and FFT insets which corresponds to the (011) plane of VO 2 -M1 phase.…”
Section: Forming and Switching Mechanismmentioning
confidence: 64%
“…[19] X-ray Photoelectron Spectroscopy: XPS spectra of a-VO x thinfilms were collected with Thermo Scientific K-alpha instrument. Primary target used was vanadium (V), with a substrate of thermally-grown silicon dioxide (300 nm) on silicon (SiO 2 /Si).…”
Section: Methodsmentioning
confidence: 99%
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“…VO 2 can be synthesized both in bulk powder form as well as in thin film form. As the latter is more suitable option for a variety of applications pertaining to device design and surfaces, many groups have investigated the growth of VO 2 films using pulsed laser deposition (PLD) [16,17], magnetron sputtering [18][19][20][21][22], molecular beam epitaxy (MBE) [23], e-beam deposition [24][25][26], sol-gel [27][28][29][30][31][32] and CVD [33][34][35][36][37][38] methods. Some of these attempts also focused on the effect of strain via the choice of the substrate on the phase transition characteristics of this system [39][40][41][42][43][44], while there was at least one work attempting to utilize the MBE method that is known for small scale film growth to obtain high quality VO 2 films on large area substrate [45].…”
Section: Introductionmentioning
confidence: 99%
“…Post-deposition annealing at low pressure enhances the level of control over oxygen vacancies and limits oxygen loss, which happens at a rapid rate in VO 2 thin films. X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), and micro-Raman spectroscopy were conducted to characterize the VO 2 thin films 57 . The thin films showed good insulator–metal transition, as expected at ~68 °C for the VO 2 phase of vanadium oxide 57 .…”
Section: Device Fabrication and Characterizationmentioning
confidence: 99%