Interdiffusion behavior between Nb and MoSi2 intermetallic compound

Yao, Dengzun; Yang, Junyi; Gong, Weiyan; Zhou, Chungen

doi:10.1016/j.msea.2010.07.042

Cited by 16 publications

(5 citation statements)

References 32 publications

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“…As shown in figure 1(c), the peaks at 328 cm −1 and 440 cm −1 in the Raman spectra confirmed the tetragonal (C11b) crystal structure of MoSi 2 , yet Mo 5 Si 3 cannot be characterized by Raman spectroscopy since the atoms form metallic bonds and do not exhibit Raman activity [18]. The above characterization results showed that the white particles dispersed in hot-pressed MoSi 2 were mainly silicide-poor Mo 5 Si 3 , which may be formed by trace selective oxidation during the hot-pressing process, which was also observed in previous study [14,19].…”

Section: Resultssupporting

confidence: 81%

Temperature dependence mechanism of high-temperature oxidation of transition metal silicide MoSi₂

Huang,

Zhang,

et al. 2024

J. Phys.: Condens. Matter

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Transition metal silicides represented by MoSi2 have excellent oxidation resistance and are widely used as high-temperature anti-oxidation coatings in hot end components of power equipment. However, the mechanism of temperature-dependent growth of MoSi2 oxidation products has not been revealed. Therefore, this study investigated the formation characteristics of oxide film and silicide-poor compound on MoSi2 at temperatures of 1000-1550℃ through high-temperature oxidation experiments, combined with microscopic Raman spectroscopy, SEM, and XRD characterizations. The result showed that MoSi2 underwent high-temperature selective oxidation reactions at 1000-1200℃, forming MoO2 and SiO2 oxide film on the substrate. As the oxidation temperature increased to 1550℃, after 100 hours of oxidation, along with the disappearance of MoO2 and the phase transformation of SiO2, a continuous Mo5Si3 layer with a thickness of approximately 47 μm was formed at the SiO2-MoSi2 interface. Thermodynamics and kinetic calculations further revealed the mechanism of temperature-dependent growth of oxidation products (MoO2 and Mo5Si3) during high-temperature oxidation process of MoSi2. As the temperature increased, the diffusion flux ratio of O and Si decreased, leading to a decrease in oxygen concentration at the interface and promoting the growth of the Mo5Si3 layer. Its thickness is an important indicator for evaluating the oxidation resistance of MoSi2 coatings during service. This study provides experimental and mechanistic insights into the temperature-dependent growth behavior of Mo5Si3 during the high-temperature oxidation of MoSi2 coating, and provides guidance for predicting the service life and improving the oxidation resistance of silicide coatings.

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Section: Resultssupporting

confidence: 81%

Temperature dependence mechanism of high-temperature oxidation of transition metal silicide MoSi₂

Huang,

Zhang,

et al. 2024

J. Phys.: Condens. Matter

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“…The diffusion layer consists of (Mo,Nb) 5 Si 3 by EDS (spot 1 and 2) and it is formed by the mutual diffusion of Si and Nb during high‐temperature sintering. [ 38,39 ] Similar crack‐free coating and diffusion layer are also observed in MC coating ( Figure ). However, some obvious pores are found in the MC coating, and these pores will become the diffusion channel of oxygen to deteriorate the protective effect of coatings.…”

Section: Resultssupporting

confidence: 60%

Microstructural Characterization and Anti‐Oxidation Properties of Molybdenum Disilicide Coating on Niobium by Spent MoSi₂‐Based Materials

et al. 2020

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MoSi2 coatings are prepared using spent and commercial MoSi2 powders as raw materials to protect niobium (Nb) substrate by spark plasma sintering (SPS) technique, and the microstructure and oxidation resistance of the coatings at 1500 °C are investigated. Results showed that obvious pores are found in MoSi2 coating using commercial MoSi2 (MC coating) after SPS while MoSi2 coating using spent MoSi2 (MS coating) is dense with low porosity. (Mo,Nb)5Si3 diffusion layer is generated between MS coating and the substrate with no gap or cracks, showing excellent metallurgical bonding. After long‐term oxidation at elevated temperature, pores and exposed Mo5Si3 can be observed in the oxide scale of MC coating, while dense and complete oxide scale is obtained by MS coating. Lowest mass gain (2.78 mg cm−2) is acquired by MS coating after oxidation at 1500 °C for 40 h because SiO2 oxide scale is completely formed on the dense and bentonite‐containing coating, blocking the diffusion of oxygen at high temperature. Compared with MC coating, no further oxidation occurs inside the MS coating or substrate, exhibiting better high‐temperature oxidation resistance.

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“…The results are shown in Figure 2. It is essential to account for the equilibrium in diffusion total flux by summing up the interdiffusion fluxes of Ti, Al and Nb [14][15].…”

Section: The Fitted Curve and Diffusion Fluxesmentioning

confidence: 99%

Ternary interdiffusion coefficients in α2-phase Ti3Al/Nb system

Wang

Yuan

Zhou

2012

J min metall B Metall

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The ?2 single phase interdiffusion in Ti3Al-Nb ternary system was studied at temperatures of 1323, 1373 and 1423 K. The interdiffusion coefficients were calculated by the method of Dayananda. The average ternary interdiffusion coeffcients were determined in the mid of the diffusion zone, and the trace diffusion coefficients can be estimitaed in the limit cX?0. The obtained main interdiffusion coeffcients is little smaller than privious reported and the diffusion activation energy of Nb calculated by the trace diffusion coefficients is 299.29 kJmol-1 accoding to the Arrhenius equation. These results can provide a theoretical basis for the mechanisms of Nb improving the oxidation resistance of Ti3Al.

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Interdiffusion behavior between Nb and MoSi2 intermetallic compound

Cited by 16 publications

References 32 publications

Temperature dependence mechanism of high-temperature oxidation of transition metal silicide MoSi₂

Temperature dependence mechanism of high-temperature oxidation of transition metal silicide MoSi₂

Microstructural Characterization and Anti‐Oxidation Properties of Molybdenum Disilicide Coating on Niobium by Spent MoSi₂‐Based Materials

Ternary interdiffusion coefficients in α2-phase Ti3Al/Nb system

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Interdiffusion behavior between Nb and MoSi2 intermetallic compound

Cited by 16 publications

References 32 publications

Temperature dependence mechanism of high-temperature oxidation of transition metal silicide MoSi2

Temperature dependence mechanism of high-temperature oxidation of transition metal silicide MoSi2

Microstructural Characterization and Anti‐Oxidation Properties of Molybdenum Disilicide Coating on Niobium by Spent MoSi2‐Based Materials

Ternary interdiffusion coefficients in α2-phase Ti3Al/Nb system

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Temperature dependence mechanism of high-temperature oxidation of transition metal silicide MoSi₂

Temperature dependence mechanism of high-temperature oxidation of transition metal silicide MoSi₂

Microstructural Characterization and Anti‐Oxidation Properties of Molybdenum Disilicide Coating on Niobium by Spent MoSi₂‐Based Materials