2023
DOI: 10.1016/j.microrel.2023.115024
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Interfacial trap charge and self-heating effect based reliability analysis of a Dual-Drain Vertical Tunnel FET

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Cited by 15 publications
(1 citation statement)
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“…Gate-all-around tunnel FETs (GAA-TFETs) 20,21 are expected to exhibit positive impact on the tunneling mechanism owing to reduced screening length (λ), volume inversion across S/C interface due to presence of the surrounding gate which further improves gate controllability over the entire channel. Further, vertical tunnel FET 22,23 structure is the device in which rate of tunneling is improved by activation of the tunneling mechanism is both lateral and vertical directions caused by electric field induced in both the directions around C/S interface. For instance, Madan et al 24 proposed a hetero-dielectric GAA-TFET in which stack of SiO 2 and HfO 2 is used as gate oxide, which improves I ON /I OFF ratio up to 1.2 Â 10 11 .…”
Section: Introductionmentioning
confidence: 99%
“…Gate-all-around tunnel FETs (GAA-TFETs) 20,21 are expected to exhibit positive impact on the tunneling mechanism owing to reduced screening length (λ), volume inversion across S/C interface due to presence of the surrounding gate which further improves gate controllability over the entire channel. Further, vertical tunnel FET 22,23 structure is the device in which rate of tunneling is improved by activation of the tunneling mechanism is both lateral and vertical directions caused by electric field induced in both the directions around C/S interface. For instance, Madan et al 24 proposed a hetero-dielectric GAA-TFET in which stack of SiO 2 and HfO 2 is used as gate oxide, which improves I ON /I OFF ratio up to 1.2 Â 10 11 .…”
Section: Introductionmentioning
confidence: 99%