Interference inspection of the aspherical components of an objective for nanolithography

Voznesensky, Nikolay B.; Gavrilov, E. V.; Zhevlakov, A. P.; Kirillovskiĭ, V. K.; Orlov, P. V.

doi:10.1134/s106378420702020x

Cited by 7 publications

(5 citation statements)

References 3 publications

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“…They can not be used for direct measurements of individual mirrors. Especially it relates to aspherical mirrors since for their characterization is necessary to convert a reference spherical wave into aspherical one nearest to the aspherics under study, as it is easily can be done with a visible light interferometers [10]. The second reason is a fact that in the course of a substrate production an optician needs real-time data of surface parameters for correction the manufacturing process.…”

Section: Point Diffraction Interferometer For High Precision Surface mentioning

confidence: 99%

<title>Manufacturing and investigation of objective lens for ultrahigh resolution lithography facilities</title>

et al. 2008

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Status of activities in field of manufacturing and investigation of objective lens for ultrahigh resolution lithography facilities carrying out in IPM RAS is reported. Some physical aspects of operation of interferometers with diffraction reference wave are considered. A scheme of a point diffraction interferometer developed in IPM is presented. Last experimental data on making high precision spherical substrates with NA=0.25 are presented. A problem of surface shape measurements of aspherical substrates with a help of a point diffraction interferometer is discussed. A scheme of measurements and experimental data of wave deformation of 6-lens objective are given.

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Section: Point Diffraction Interferometer For High Precision Surface mentioning

confidence: 99%

<title>Manufacturing and investigation of objective lens for ultrahigh resolution lithography facilities</title>

et al. 2008

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“…Currently two main approaches are used at correctors formation: diffraction and with use of single lenses and objective-glasses [5][6][7][8][9][10]. For X-ray optics application, where nanometric and even subnanometric precision of optical surfaces shape is required, the correction of corrector aberrations is required.…”

Section: Introductionmentioning

confidence: 99%

“…Diffraction corrector can not be fixed with ionic beams. This means that for studying the ultrahigh-precision optical elements aberrations it is possible to use lens correctors only, for instance [9,10]. However, the above mentioned correctors were used for studying the concave aspherical surfaces with deviations from the nearest sphere of at least 10 µm, thus allowing to make them using conventional optical machines by means of lapping with the following aberrations correction with ionic beams.…”

Section: Introductionmentioning

confidence: 99%

Wavefront lens corrector for studying flat surfaces

et al. 2022

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The method of manufacturing and the results of studies of a lens corrector that converts a spherical diverging front into a plane one and is intended for studying flat surfaces as part of an interferometer with a diffraction comparison wave is described. A feature of the corrector is the use of an aspherical convex surface with a maximum deviation of ~ 200 μm from the nearest sphere. The first experimental results are presented, indicating the prospects for using ion-beam processing to improve the quality of the wavefront. After the procedure of ion-beam processing, the aberrations over the entire aperture of the corrector decreased by more than 4 times and amounted to the parameter of the height difference PV = 207 nm (~ λ/3) and (RMS) = 19.2 nm (~ λ/33). On an area with a diameter of 80%, the aberrations fell to the nanometer level: PV = 65 nm (~ λ/10) and RMS = 8.3 nm (~ λ/76). Keywords: lens corrector, interferometry, aspherical lens, ion-beam processing.

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“…В настоящее время применяются два основных подхода при формировании корректоров: дифракционный и с использованием одиночных линз и объективов [5][6][7][8][9][10]. Для рентгенооптических приложений, где требуется нанометровая и даже субнанометровая точность формы оптических поверхностей, требуется корректировка аберраций самого корректора.…”

Section: Introductionunclassified

“…Дифракционный корректор нельзя исправить ионными пучками. Это означает, что для изучения аберраций сверхвысокоточных оптических элементов можно использовать только линзовые корректоры, например [9,10]. Однако отмеченные выше корректоры применялись для изучения вогнутых асферических поверхностей с отклонениями от ближайшей сферы менее 10 µm, что позволяет их изготовить на традиционных оптических станках методом притира с последующей коррекцией аберраций ионными пучками.…”

Section: Introductionunclassified

Линзовый Корректор Волнового Фронта Для Изучения Плоских Поверхностей

Toropov¹,

Ахсахалян²,

Malyshev³

et al. 2021

Журнал Технической Физики

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The method of manufacturing and the results of studies of a lens corrector that converts a spherical diverging front into a plane one and is intended for studying flat surfaces as part of an interferometer with a diffraction comparison wave is described. A feature of the corrector is the use of an aspherical convex surface with a maximum deviation of ∼200 μm from the nearest sphere. The first experimental results are presented, indicating the prospects for using ion-beam processing to improve the quality of the wavefront. After the procedure of ion-beam processing, the aberrations over the entire aperture of the corrector decreased by more than 4 times and amounted to the parameter of the height difference PV = 207 nm (∼λ/3) and RMS = 19.2 nm (∼λ /33). On an area with a diameter of 80%, the aberrations fell to the nanometer level: PV = 65 nm (∼λ/10) and RMS = 8.3 nm (∼λ/76).

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Interference inspection of the aspherical components of an objective for nanolithography

Cited by 7 publications

References 3 publications

<title>Manufacturing and investigation of objective lens for ultrahigh resolution lithography facilities</title>

<title>Manufacturing and investigation of objective lens for ultrahigh resolution lithography facilities</title>

Wavefront lens corrector for studying flat surfaces

Линзовый Корректор Волнового Фронта Для Изучения Плоских Поверхностей

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