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STATEMENT BY AUTHORThis dissertation has been submitted in partial fulfillment of requirements for an advanced degree at the University of Arizona and is deposited in the university library to be made available to borrowers under rules of the Library.Brief quotations from this dissertation are allowable without special permission, provided that accurate acknowledgement of the source is made. Requests for permission for extended quotation firom or reproduction of this manuscript in whole or in part may be granted by the head of the major department or the dean of the graduate college when in his or her judgement the proposed use of the material is in the interests of scholarship. In all other instances, however, permission must be granted firom the author Table 5 Results of repeatability measurements for silicon substrate A 126 Table 6 Results of repeatability measurements for 126nm Si02 coating A 126 Table 7 Results of repeatability measurements for ratio of reflectance measurement 128
ABSTRACTA novel imaging ellipsometer has been developed; the phase shifting interferometric imaging ellipsometer (PSIIE) is the first ellipsometer to use phase-shifting interferometry for data acquisition. The only moving part in the system is a solid state PZT. The PSIIE uses a polarization interferometer, followed by a Wollaston prism, to obtain simultaneously, samples of the S and P polarization component interferograms.Interferogram phase yields the ellipsometric parameter, A, while the fringe modulation yields the tangent of the ellipsometric parameter 4^. The instrument can perform multiple wavelength and multiple angle-of-incidence ellipsometry over the entire visible range with the addition of a tunable las...