The reconfigurability of the electrical heterostructure
featured
with external variables, such as temperature, voltage, and strain,
enabled electronic/optical phase transition in functional layers has
great potential for future photonics, computing, and adaptive circuits.
VO2 has been regarded as an archetypal phase transition
building block with superior metal–insulator transition characteristics.
However, the reconfigurable VO2-based heterostructure and
the associated devices are rare due to the fundamental challenge in
integrating high-quality VO2 in technologically important
substrates. In this report, for the first time, we show the remote
epitaxy of VO2 and the demonstration of a vertical diode
device in a graphene/epitaxial VO2/single-crystalline BN/graphite
structure with VO2 as a reconfigurable phase-change material
and hexagonal boron nitride (h-BN) as an insulating layer. By diffraction
and electrical transport studies, we show that the remote epitaxial
VO2 films exhibit higher structural and electrical quality
than direct epitaxial ones. By high-resolution transmission electron
microscopy and Cs-corrected scanning transmission electron microscopy,
we show that a graphene buffered substrate leads to a less strained
VO2 film than the bare substrate. In the reconfigurable
diode, we find that the Fermi level change and spectral weight shift
along with the metal–insulator transition of VO2 could modify the transport characteristics. The work suggests the
feasibility of developing a single-crystalline VO2-based
reconfigurable heterostructure with arbitrary substrates and sheds
light on designing novel adaptive photonics and electrical devices
and circuits.