2021
DOI: 10.1016/j.ceramint.2020.12.185
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Investigating the optimum parameters of a negative photoresist to prepare a V-grooved diffraction grating on Si using photolithography and reactive ion etching techniques

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Cited by 6 publications
(3 citation statements)
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“…Fabrication techniques used in this study were chosen for their relatively low cost and ease of use in prototyping as well as for their scalability for implementation in industrial applications. Photolithographic techniques are particularly useful for accurately and reproducibly creating regular arrays of structures and can be implemented over large areas and at scales required for mass production. Due to this versatility, photolithography has been widely used for producing electrocatalysts for gas-evolving electrochemical reactions. , ,, In this work, MPP was used to prepare microscale structures on the electrocatalysts. The main difference between MPP and standard photolithography techniques is the position of the photomask relative to that of the ultraviolet (UV) light source.…”
Section: Resultsmentioning
confidence: 99%
“…Fabrication techniques used in this study were chosen for their relatively low cost and ease of use in prototyping as well as for their scalability for implementation in industrial applications. Photolithographic techniques are particularly useful for accurately and reproducibly creating regular arrays of structures and can be implemented over large areas and at scales required for mass production. Due to this versatility, photolithography has been widely used for producing electrocatalysts for gas-evolving electrochemical reactions. , ,, In this work, MPP was used to prepare microscale structures on the electrocatalysts. The main difference between MPP and standard photolithography techniques is the position of the photomask relative to that of the ultraviolet (UV) light source.…”
Section: Resultsmentioning
confidence: 99%
“…microfluidics, 20,21 microelectromechanical systems, 22 textured electrocatalysts, 23 integrated circuits, 24 and micro-to-nanoscale optical components. 25,26 A variety of systems have been reported to demonstrate reliable, low-cost fabrication of microto-nanoscale structures using MPP. These MPP systems have included (i) the use of colored masks to create multilevel structures; 27 (ii) the use of ultraviolet light-emitting diodes (UV-LEDs) as the light source for the fabrication of components, such as nanoscale optical devices; 28,29 and (iii) numerous designs for maskless MPP systems, such as those that use liquid crystal displays or digital micromirror devices in place of a mask or focused electron-beam writing techniques.…”
Section: Introductionmentioning
confidence: 99%
“…Microscope projection photolithography is a versatile and cost-effective method of transferring a pattern to a small substrate (e.g., <1 cm 2 ). This technique can be used to produce patterns without the need for equipment, such as mask aligners, or the need for a clean room environment, since MPP is accomplished without physical contact with the surfaces of a substrate. , As such, MPP is an ideal technique for rapid prototyping in a variety of applications, such as in microfluidics, , microelectromechanical systems, textured electrocatalysts, integrated circuits, and micro-to-nanoscale optical components. , A variety of systems have been reported to demonstrate reliable, low-cost fabrication of micro-to-nanoscale structures using MPP. These MPP systems have included (i) the use of colored masks to create multilevel structures; (ii) the use of ultraviolet light-emitting diodes (UV-LEDs) as the light source for the fabrication of components, such as nanoscale optical devices; , and (iii) numerous designs for maskless MPP systems, such as those that use liquid crystal displays or digital micromirror devices in place of a mask or focused electron-beam writing techniques. …”
Section: Introductionmentioning
confidence: 99%