Investigation of a distributed antenna array microwave system for the three-dimensional low-temperature growth of nanocrystalline diamond films

Dekkar, Damia; Bénédic, F.; Falentin‐Daudre, Céline; Brinza, Ovidiu; Issaoui, Riadh; Achard, Jocelyn

doi:10.1016/j.diamond.2019.02.016

Cited by 8 publications

(6 citation statements)

References 16 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Among these new technologies, a distributed antenna array (DAA) microwave system composed of a 4 × 4 source planar matrix was designed in order to achieve NCD films at a substrate temperature as low as 100 • C on fourinch wafers. Its efficiency for NCD growth on conventional (silicon) and unconventional substrates such as silicon nitride, AlN/ZnO/IDTs/LiNbO 3 multilayered structures and titanium implants has been demonstrated [4][5][6]. However, such a low temperature process is associated with a very low growth rate of only a few tens of nanometer per hour (nm h −1 ) at the best [7].…”

Section: Introductionmentioning

confidence: 99%

Effect of the admixture of N₂to low pressure, low temperature H₂-CH₄-CO₂microwave plasmas used for large area deposition of nanocrystalline diamond films

Dekkar¹,

Puth²,

Bisceglia³

et al. 2020

J. Phys. D: Appl. Phys.

View full text Add to dashboard Cite

In a distributed antenna array reactor, microwave H2-CH4-CO2 plasmas with admixture of N2 used for the low-temperature deposition of nanocrystalline diamond (NCD) films are studied by in situ infrared laser absorption spectroscopy (LAS) and optical emission spectroscopy techniques. The experiments are carried out in order to analyze the dependence of temperatures and species densities as a function of the admixture of nitrogen. The evolution of the concentrations of the methyl radical (CH3), and of five stable molecules (NH3, HCN, CH4, C2H2, and CO), are monitored in the plasma processes by LAS using tunable lead salt diode lasers and external-cavity quantum cascade lasers (EC-QCL) as radiation sources. OES is performed simultaneously to obtain complementary information about (i) the degree of dissociation of H2 precursor gas, (ii) the gas temperature and therefore (iii) the density of atomic hydrogen, a key species in the chemistry of NCD deposition plasmas. The species temperatures are not significantly affected by the nitrogen addition. The concentrations of the various species are in the range between 1011 to 1015 molecules cm−3. HCN and CO are the major products in the plasma besides atomic hydrogen. The analysis of the nitrogen and carbon mass balances of the measured species shows that in addition to NH3 and HCN other nitrogen containing species are produced in the plasma which were not probed. It is shown that the formation of HCN consumes C atoms that can be provided from hydrocarbon species and from the deposition of carbon-containing films on the reactor walls, which results in a decrease of the measured densities of hydrocarbon species.

show abstract

Section: Introductionmentioning

confidence: 99%

Effect of the admixture of N₂to low pressure, low temperature H₂-CH₄-CO₂microwave plasmas used for large area deposition of nanocrystalline diamond films

Dekkar¹,

Puth²,

Bisceglia³

et al. 2020

J. Phys. D: Appl. Phys.

View full text Add to dashboard Cite

show abstract

“…In the same regard, other attempts have been made to enhance the adhesion strength between Ti and NDC films through CVD methods at moderate temperatures to reduce residual stress. Dekkar et al [13] deposited NDC film on a 3D Ti implant using a distributed antenna array (DAA) (MPCVD) reactor at a median temperature (400 °C). Although MPCVD has been observed as a convenient method to deposit NDC films at lower temperatures than HFCVD, it has been reported that the growth rate decreases with decreasing substrate temperature in CVD methods [14].…”

Section: Introductionmentioning

confidence: 99%

Influence of different pretreatments on the adhesion of nanodiamond composite films on Ti substrates via coaxial arc plasma deposition

Osman

Ali

Zkria

et al. 2023

Mater. Res. Express

View full text Add to dashboard Cite

In this study, we report on the novel growth of nanodiamond composite (NDC) films on Ti substrates using the coaxial arc plasma deposition (CAPD) at room temperature, which offers several advantages over conventional growth techniques. CAPD employs a unique coaxial arc plasma gun structure that provides a supersaturated condition of highly energetic C+ ions for ultrafast quenching on the substrate, promoting the growth of nanodiamond grains. This allows for NDC films’ growth on diverse substrates without the need for initial seeding or substrate heating. However, the growth of NDC films on Ti substrates at room temperature is challenging due to the native oxide layer (TiO2). Here, we grew NDC films on Ti substrates using three different pretreatments: (i) hydrofluoric acid (HF) etching, (ii) insertion of a titanium carbide (TiC) intermediate layer, and (iii) in-situ Ar+ plasma etching. The morphology and structure of the grown NDC films were examined by 3D laser, high-resolution scanning electron microscopies (HR-SEM), Raman, and X-ray photoelectron (XPS) spectroscopies. Our results demonstrate that in-situ Ar+ plasma etching is the most effective pretreatment method for completely removing the native TiO2 layer compared to the other two ex-situ pretreatments, in which re-oxidation is more likely to occur after these pretreatments. Furthermore, NDC films grown using the hybrid Ar+ ion etching gun (IG) and CAPD exhibit the highest sp3 content (63%) and adhesion strength (16 N).

show abstract

“…23 These two techniques operate at low pressures (<2 mbar) and yield larger gas discharge volumes compared to HFCVD and MWPECVD methods, which is beneficial for diamond growth on complex-shaped objects. The latest demonstrations come from Dekkar et al, 24 showing diamond growth on a cylindricalshaped titanium implant of 6.3 mm height with the DAA CVD system, and Varga et al, 25 achieving nonuniform growth on copper rods 2.5 mm in diameter and approximately 30 mm in length using SWP CVD. Therefore, there is a need to investigate diamond synthesis on larger than the above-mentioned objects to facilitate the use of diamond-based materials for orthopedic implants such as a hip replacement.…”

Section: Introductionmentioning

confidence: 99%

Polycrystalline Diamond Coating on Orthopedic Implants: Realization and Role of Surface Topology and Chemistry in Adsorption of Proteins and Cell Proliferation

Zalieckas

Mondragon

Pobedinskas

et al. 2022

ACS Appl. Mater. Interfaces

View full text Add to dashboard Cite

Polycrystalline diamond has the potential to improve the osseointegration of orthopedic implants compared to conventional materials such as titanium. However, despite the excellent biocompatibility and superior mechanical properties, the major challenge of using diamond for implants, such as those used for hip arthroplasty, is the limitation of microwave plasma chemical vapor deposition (CVD) techniques to synthesize diamond on complex-shaped objects. Here, for the first time, we demonstrate diamond growth on titanium acetabular shells using the surface wave plasma CVD method. Polycrystalline diamond coatings were synthesized at low temperatures (∼400 °C) on three types of acetabular shells with different surface structures and porosities. We achieved the growth of diamond on highly porous surfaces designed to mimic the structure of the trabecular bone and improve osseointegration. Biocompatibility was investigated on nanocrystalline diamond (NCD) and ultrananocrystalline diamond (UNCD) coatings terminated either with hydrogen or oxygen. To understand the role of diamond surface topology and chemistry in the attachment and proliferation of mammalian cells, we investigated the adsorption of extracellular matrix proteins and monitored the metabolic activity of fibroblasts, osteoblasts, and bone-marrow-derived mesenchymal stem cells (MSCs). The interaction of bovine serum albumin and type I collagen with the diamond surfaces was investigated by confocal fluorescence lifetime imaging microscopy (FLIM). We found that the proliferation of osteogenic cells was better on hydrogen-terminated UNCD than on the oxygen-terminated counterpart. These findings correlated with the behavior of collagen on diamond substrates observed by FLIM. Hydrogen-terminated UNCD provided better adhesion and proliferation of osteogenic cells, compared to titanium, while the growth of fibroblasts was poorest on hydrogen-terminated NCD and MSCs behaved similarly on all tested surfaces. These results open new opportunities for application of diamond coatings on orthopedic implants to further improve bone fixation and osseointegration.

show abstract

Investigation of a distributed antenna array microwave system for the three-dimensional low-temperature growth of nanocrystalline diamond films

Cited by 8 publications

References 16 publications

Effect of the admixture of N₂to low pressure, low temperature H₂-CH₄-CO₂microwave plasmas used for large area deposition of nanocrystalline diamond films

Effect of the admixture of N₂to low pressure, low temperature H₂-CH₄-CO₂microwave plasmas used for large area deposition of nanocrystalline diamond films

Influence of different pretreatments on the adhesion of nanodiamond composite films on Ti substrates via coaxial arc plasma deposition

Polycrystalline Diamond Coating on Orthopedic Implants: Realization and Role of Surface Topology and Chemistry in Adsorption of Proteins and Cell Proliferation

Contact Info

Product

Resources

About

Investigation of a distributed antenna array microwave system for the three-dimensional low-temperature growth of nanocrystalline diamond films

Cited by 8 publications

References 16 publications

Effect of the admixture of N2to low pressure, low temperature H2-CH4-CO2microwave plasmas used for large area deposition of nanocrystalline diamond films

Effect of the admixture of N2to low pressure, low temperature H2-CH4-CO2microwave plasmas used for large area deposition of nanocrystalline diamond films

Influence of different pretreatments on the adhesion of nanodiamond composite films on Ti substrates via coaxial arc plasma deposition

Polycrystalline Diamond Coating on Orthopedic Implants: Realization and Role of Surface Topology and Chemistry in Adsorption of Proteins and Cell Proliferation

Contact Info

Product

Resources

About

Effect of the admixture of N₂to low pressure, low temperature H₂-CH₄-CO₂microwave plasmas used for large area deposition of nanocrystalline diamond films

Effect of the admixture of N₂to low pressure, low temperature H₂-CH₄-CO₂microwave plasmas used for large area deposition of nanocrystalline diamond films