“…The I s , n and Φ Bo values determined from the forward bias ln I-V plots are 3.11 Â 10 À 9 A, 2.93, and 0.78 eV for Au/PVCþTCNQ/p-Si and 6.66 Â 10 À 6 A, 5.76, and 0.57 eV for Au/Mo-doped (PVCþ TCNQ)/p-Si structures, respectively, at room temperature and they are also shown in Table 1. These high values of n for both diodes can be attributed to the particular density distribution of surface states (N ss ) localized at M/S interface, the thickness of interfacial layer and its inhomogeneity, and the nature of barrier height at M/S interface [23][24][25][26][27][28][29][30]. Also, the image-force effect, recombination-generation, and tunneling via interface states may be possible mechanisms that lead to decrease in n value [24,31].…”