Si thin films have attracted increasing interest in recent years owing to their applications in thin-film transistors and thin-film solar cells. Such films can be fabricated by different techniques, under very different conditions and can be made amorphous as well as hydrogenated microcrystalline (a-Si and µc-Si). Of particular interest is the mechanisms occurring during film growth that are responsible for the transition from amorphous to microcrystalline growth. Improved understanding of these mechanisms may afford a better control of the deposition process and yield a higher performance devices. Furthermore, little has been reported on the structural and morphological properties of such films 1,2,3 .