2011
DOI: 10.1016/j.physb.2011.06.001
|View full text |Cite
|
Sign up to set email alerts
|

Investigation of electrical and optoelectronic properties of zinc oxide nanowires

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3

Citation Types

0
3
0

Year Published

2012
2012
2023
2023

Publication Types

Select...
6

Relationship

0
6

Authors

Journals

citations
Cited by 8 publications
(3 citation statements)
references
References 29 publications
0
3
0
Order By: Relevance
“…15,16 On the other hand, the field-effect measurement has been performed on ZnO NWs to probe the electrical transport properties using various construction procedures. 17,18 In most cases, the NW is prepared in isopropanol alcohol or ethanol and then dispersed onto a SiO 2 /Si substrate. Subsequently, the NW is located and contacted by micro-electrodes which were patterned by photolithography, electron-beam lithography, or focused ion beam techniques.…”
Section: Introductionmentioning
confidence: 99%
See 1 more Smart Citation
“…15,16 On the other hand, the field-effect measurement has been performed on ZnO NWs to probe the electrical transport properties using various construction procedures. 17,18 In most cases, the NW is prepared in isopropanol alcohol or ethanol and then dispersed onto a SiO 2 /Si substrate. Subsequently, the NW is located and contacted by micro-electrodes which were patterned by photolithography, electron-beam lithography, or focused ion beam techniques.…”
Section: Introductionmentioning
confidence: 99%
“…Various techniques have been employed for characterizing semiconductor NWs; the most commonly used techniques being the Hall-effect and field-effect measurements. Many efforts have been made using the Hall effect measurement technique, which is geometrically difficult to perform on NWs, and only few literature studies report Hall effect measurements on ZnO NWs. , On the other hand, the field-effect measurement has been performed on ZnO NWs to probe the electrical transport properties using various construction procedures. , In most cases, the NW is prepared in isopropanol alcohol or ethanol and then dispersed onto a SiO 2 /Si substrate. Subsequently, the NW is located and contacted by micro-electrodes which were patterned by photolithography, electron-beam lithography, or focused ion beam techniques. Therefore, the contact resistance and Schottky barrier at NW–electrode junctions that comprise the ZnO NW FET limit the device performance considerably due to different work functions, resulting in an overestimation of the field-effect mobility because the calculation does not take the contact resistance into account. , However, these techniques have several points in common which can be highlighted: (a) the devices are constructed on two, three, or four electrodes processed via a series of nanofabrication procedures for current transport studies.…”
Section: Introductionmentioning
confidence: 99%
“…The nanoscale proximity of ZnO and CNTs enable sub-second photoresponse upon pulsed illumination as compared to ZnO thin-film photodetectors whose response time can be as long as minutes or more . Moreover, the ZnO–CNT hybrid exhibits a large photocurrent of μA-mA, compared to ∼nA levels measured for devices based on a single ZNW , or ZNW arrays, at comparable UV illumination intensity. Last, we study how the amplitude and direction of the photocurrent are controlled by competition between the built-in potential formed in ZnO−CNT interface and the externally applied bias.…”
Section: Introductionmentioning
confidence: 99%