Abstract:In this paper, we propose a method for reducing the energy loss of photosensitive structures based on nanocrystalline silicon using passivating coatings of dysprosium fluoride. Since this material has good optical and photoelectric properties, when preparing Si/DyF3 structures, the dielectric film makes it possible to reduce the number of recombination centers and increase light absorption. Methods for creating and studying photosensitive structures with coatings are shown. A technique for determining the thic… Show more
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