Investigation of electron beam parameters inside the drift region of plasma cathode electron gun

Verma, Deepak Kumar; Pal, Udit Narayan; Kumar, Niraj; Prajapati, Jitendra; Kumar, Mahesh; Prakash, Ram; Srivastava, V.

doi:10.1088/1742-6596/365/1/012048

Cited by 3 publications

(9 citation statements)

References 11 publications

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“…Much higher peak e-currents can be achieved in the so-called pseudo-spark pulsed discharge in the plasma cathode e-gun shown in Figure 11a [71], which is very similar in appearance to the cwoperated e-gun described above. The discharge occurred at an Ar operating pressure of about 80 Pa in a cylindrical discharge chamber with a height and a diameter of about 59 mm.…”

Section: E-source With a Hollow Cathodementioning

confidence: 54%

“…Maximum e-beam currents − up to several amperes and above − can be achieved using the socalled e-guns with "plasma cathodes", which are based on the extracting an e-beam from a plasma generated either in a hollow cathode discharge [69][70][71][72] or in a surface discharge near the ferroelectric surface [73][74][75][76][77][78][79][80][81] without thermionic cathodes and other heated parts.…”

Section: Electron Guns With Plasma Cahodesmentioning

confidence: 99%

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Electron-Beam Pumped UVC-Emitters Based on (Al, Ga)N Material System

Jmerik¹,

Kozlovsky²,

Wang³

2023

Preprint

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Powerful emitters of the ultraviolet C (UVC) light in the wavelength range of 230-280nm are necessary for the development of effective and safe optical disinfection technologies, high-sensitive optical spectroscopy and non-line-of-sight optical communication. This review considers such UVC-emitters with electron-beam pumping of heterostructures with quantum wells in the (Al,Ga)N material system. The important advantages of these emitters include the absence of the critical problem of p-type doping and the possibility of achieving record (up to several tens of watts for peak values) output optical power values in the UVC range. The review consistently considers about a decade of world experience in the implementation of various UV emitters with various types of thermionic, field-emission, and plasma-cathode electron guns (sources) used to excite various designs of active (light-emitting) regions in heterostructures with quantum wells AlxGa1-xN/AlyGa1-yN (x = 0 − 0.5, y = 0.6 − 1) fabricated either by metal-organic chemical vapor deposition or by plasma-activated molecular beam epitaxy. Special attention is paid to the production of heterostructures with multiple quantum wells/two-dimensional(2D) quantum disks GaN/AlN with a monolayer (1ML ~ 0.25nm) thickness, which ensures a high internal quantum efficiency of radiative recombination in the UVC range, low elastic stresses in heterostructures, and a high output UVC-optical powers.

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Section: E-source With a Hollow Cathodementioning

confidence: 54%

Section: Electron Guns With Plasma Cahodesmentioning

confidence: 99%

Electron-Beam Pumped UVC-Emitters Based on (Al, Ga)N Material System

Jmerik¹,

Kozlovsky²,

Wang³

2023

Preprint

View full text Add to dashboard Cite

show abstract

“…It is important that this linear dependence was observed at the optimum operating air pressure of 10 mTorr and a magnetic field of 17 mT. Much higher peak e-currents were achieved in [74], which describes the so-called pseudo-spark pulsed discharge in an e-gun with a plasma cathode, shown in Figure 11a. This e-gun is very similar in appearance to the cw-operated e-gun described above.…”

Section: E-source With a Hollow Cathodementioning

confidence: 98%

“…The maximum e-beam currents-up to several amperes and above-can be achieved using so-called e-guns with "plasma cathodes", based on the extraction of the e-beam from the plasma generated either in a hollow cathode discharge [72][73][74][75] or in a surface…”

Section: Electron Guns With Plasma Cahodesmentioning

confidence: 99%

Electron-Beam-Pumped UVC Emitters Based on an (Al,Ga)N Material System

2023

View full text Add to dashboard Cite

Powerful emitters of ultraviolet C (UVC) light in the wavelength range of 230–280 nm are necessary for the development of effective and safe optical disinfection technologies, highly sensitive optical spectroscopy and non-line-of-sight optical communication. This review considers UVC emitters with electron-beam pumping of heterostructures with quantum wells in an (Al,Ga)N material system. The important advantages of these emitters are the absence of the critical problem of p-type doping and the possibility of achieving record (up to several tens of watts for peak values) output optical power values in the UVC range. The review consistently considers about a decade of world experience in the implementation of various UV emitters with various types of thermionic, field-emission, and plasma-cathode electron guns (sources) used to excite various designs of active (light-emitting) regions in heterostructures with quantum wells of AlxGa1−xN/AlyGa1−yN (x = 0–0.5, y = 0.6–1), fabricated either by metal-organic chemical vapor deposition or by plasma-activated molecular beam epitaxy. Special attention is paid to the production of heterostructures with multiple quantum wells/two-dimensional (2D) quantum disks of GaN/AlN with a monolayer’s (1 ML~0.25 nm) thickness, which ensures a high internal quantum efficiency of radiative recombination in the UVC range, low elastic stresses in heterostructures, and high-output UVC-optical powers.

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“…The PS discharge goes through various complex discharge processes and depends primarily on the PS discharge configurations [24][25][26][27][28][29]. Since its discovery in 1978, efforts have been made to understand the PS discharge phenomena for the generation of high density and energetic electron beams by theoretical, plasma simulation, and experimental studies [9,18,24,[29][30][31][32][33][34][35][36][37][38].…”

Section: Introductionmentioning

confidence: 99%

Compact high‐power millimetre wave sources driven by pseudospark‐sourced electron beams

Yin¹,

Zhang²,

Xie³

et al. 2019

IET Microwaves, Antennas & Propagation

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This article presents the demonstration of several compact millimetre wave sources driven both by a pencil or sheet electron beam from a pseudospark discharge. The millimetre wave sources include two pencil beam extended interaction oscillators (EIO) in W-band (75-110 GHz), two sheet beam EIOs in Wand G-band, two pencil beam backward wave oscillators (BWO) in Wand G-band, and one pencil beam Cherenkov maser in Ka-band. These devices can generate up to kilowatts of output power, which are very attractive for many important applications.

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Investigation of electron beam parameters inside the drift region of plasma cathode electron gun

Cited by 3 publications

References 11 publications

Electron-Beam Pumped UVC-Emitters Based on (Al, Ga)N Material System

Electron-Beam Pumped UVC-Emitters Based on (Al, Ga)N Material System

Electron-Beam-Pumped UVC Emitters Based on an (Al,Ga)N Material System

Compact high‐power millimetre wave sources driven by pseudospark‐sourced electron beams

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