Investigation of High‐<i>k</i>Dielectric Stacks by C‐AFM: Advantages, Limitations, and Possible Applications

Rommel, Mathias; Paskaleva, A.

doi:10.1002/9783527699773.ch4

Conductive Atomic Force Microscopy 2017

DOI: 10.1002/9783527699773.ch4

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Investigation of High‐kDielectric Stacks by C‐AFM: Advantages, Limitations, and Possible Applications

Mathias Rommel

A. Paskaleva

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Investigation of High‐kDielectric Stacks by C‐AFM: Advantages, Limitations, and Possible Applications

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References 59 publications

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