2008
DOI: 10.1016/j.spmi.2007.06.001
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Investigation of InGaP/InGaAs n- and p-channel pseudomorphic modulation-doped field effect transistors with high gate turn-on voltages

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Cited by 4 publications
(6 citation statements)
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“…Apparently, two linear regions appear in the transfer characteristic due to the existence of the two individual channel layers in the depletion-mode device. As compared with the previous InGaP/InGaAs HEMT and DCFET, the studied device exhibits higher drain current, higher transconductance, and larger gate turn-on voltage [3,4].…”
Section: Resultsmentioning
confidence: 76%
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“…Apparently, two linear regions appear in the transfer characteristic due to the existence of the two individual channel layers in the depletion-mode device. As compared with the previous InGaP/InGaAs HEMT and DCFET, the studied device exhibits higher drain current, higher transconductance, and larger gate turn-on voltage [3,4].…”
Section: Resultsmentioning
confidence: 76%
“…GaAs-based heterostructure field-effect transistors (HFETs), such as electron mobility transistors (HEMTs) and doped-channel field effect transistors (DCFETs), have been considered to be the promising devices in signal amplifier, microwave, gas detector, and digital integrated circuits [1][2][3][4][5][6]. As to the HEMTs, though the maximum transconductance value may be relatively high due to the high carrier mobility, the average transconductance was low and they suffered from small gate voltage swing [3].…”
Section: Introductionmentioning
confidence: 99%
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“…GaAs-based modulation doped field-effect transistors (MODFETs), which are based on carrier transfer from a highly doped barrier layer into undoped GaAs or InGaAs layer, are widely used in high-speed device applications [1]. After the excellent performance of GaN-based high-electron mobility transistors (HEMTs) reported by Khan et al, many successful GaN-based HEMTs including MODFETs have been demonstrated [2][3][4].…”
Section: Introductionmentioning
confidence: 99%