Investigation of Plasmon Gold Film Nanostructures by Means of both X-Ray Reflectometry and Diffractometry

Gudymenko, O.; Kryvyi, Serhii; Stanchu, H. V.; Kladko, V. P.; Safryuk, N. V.; Slobodian, M. V.

doi:10.15407/mfint.37.09.1215

Cited by 4 publications

(1 citation statement)

References 12 publications

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“…The XRR method is based on the total internal reflection of X-rays from the sample surface. The high sensitivity to slight changes in the electron density is one of the advantages of this method [12].…”

Section: Introductionmentioning

confidence: 99%

Effect of electron-beam treatment of sensor glass substrates for SPR devices on their metrological characteristics

Ващенко¹

2019

Semicond. phys. quantum electr. optoelectron

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Electron-beam treatment the glass substrates for sensitive elements of SPR devices causes almost twofold narrowing their refractometric characteristics from 0.867 down to 0.453 deg. The angular shift was also changed, which made the measuring range wider by 0.37 deg. The sensitivity of SPR devices increased by 1.7 times from 1.425 up to 2.396 deg-1 as a consequence of lowering the energy expenses during propagation of surface plasmons along the boundary "metal-air". The reason for this lowering is related to higher surface uniformity of the gold metal film, its higher density as well as lower nanoroughness of the glass surface and the thickness of heterointerface "gold-air". In this case, the dispersion value for unevenness heights on the surface relatively to the base line was lowered from ±18 down to ±5 nm, mean-square roughness was threefold reduced from 4.67 down to 1.64 nm, and the thickness of heterointerface gold-air was lowered from 3.26 down to 1.37 nm. It was ascertained using X-ray reflectometry that the film density increased from 17.2 up to 19.3 g/cm 3 and reached the value typical for the bulk gold. It provided the changes in the refraction index and extinction coefficient of the gold film, which was ascertained using the ellipsometric method. Thus, the performed analysis of refractometric characteristics showed that electron-beam treatment the glass substrates of sensitive elements for SPR devices is able to efficiently enhance their sensitivity and to widen the range of measured resonance SPR angles.

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Section: Introductionmentioning

confidence: 99%

Effect of electron-beam treatment of sensor glass substrates for SPR devices on their metrological characteristics

Ващенко¹

2019

Semicond. phys. quantum electr. optoelectron

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ELECTRONIC AND STRUCTURAL PROPERTIES OF Si–Gd–O ELECTRON EMITTER

et al. 2019

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Rare earth metals, when deposited and oxidized on semiconductor surfaces, can be an alternative to unstable compounds of alkali metals while creating stable and effective emitters with a low work function. A procedure giving rise to the adsorption of Gd and O atoms on the Si(100) surface and the formation of a Si–Gd–O film with a work function of about 1 eV in the near-surface region is described. The films have been studied using the Auger electron and photoelectron spectroscopy, as well as X-ray diffraction, atomic force and Kelvin probe force microscopy techniques. Information about their electronic properties, structure, surface morphology, and surface distribution of potential was obtained. The main component of the film formed on the Si surface is a polycrystalline Gd2O3 phase, which plays the role of a matrix containing textured microcrystallites of one of the following phases: SiO2, GdO2, or GdSi2. The film surface consists of salient clusters 20[Formula: see text]nm to 80[Formula: see text]nm in diameter and up to 20[Formula: see text]nm in height, as well as craters up to 90[Formula: see text]nm in depth. The surface relief inhomogeneities correlate with the surface distribution of the local work function. This correlation can also be a result of the piezoelectric effect in the strained crystallites of the textured phase located in the bulk of the film. The obtained system was stable in time under vacuum conditions and heating up to [Formula: see text]C. The method proposed for the formation of surfaces with a low work function making use of rare earth metals can be applied to create effective and stable electron emitters.

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PHOTOLUMINESCENCE PROPERTIES OF SILICON NANOPARTICLES IN MULTILAYERED (SiOx-SiOy)n STRUCTURES WITH POROUS INSULATING LAYERS

Michailovska¹

2018

Optoelektron. napìvprovìd. teh.

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Investigation of Plasmon Gold Film Nanostructures by Means of both X-Ray Reflectometry and Diffractometry

Cited by 4 publications

References 12 publications

Effect of electron-beam treatment of sensor glass substrates for SPR devices on their metrological characteristics

Effect of electron-beam treatment of sensor glass substrates for SPR devices on their metrological characteristics

ELECTRONIC AND STRUCTURAL PROPERTIES OF Si–Gd–O ELECTRON EMITTER

PHOTOLUMINESCENCE PROPERTIES OF SILICON NANOPARTICLES IN MULTILAYERED (SiOx-SiOy)n STRUCTURES WITH POROUS INSULATING LAYERS

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