Vacuum ultraviolet (VUV) photodetectors are essential for applications in space science, semiconductor lithography, and life science. In this study, we present what we believe to be a novel AlN-based VUV Pt-AlN Schottky barrier photodetector fabricated on a sapphire substrate. This device comprises an i-AlN/n-AlGaN layer structure and ingeniously utilizes an n-AlGaN layer and metal to establish an ohmic contact, addressing the challenge of n-type doping in AlN. Experimental results demonstrate a peak response of 0.06A/W at 194 nm under 0 V bias and clear rectification characteristics. The specific detectivity D* is 4.8 × 1012cm · Hz0.5 · W−1 at 0V bias for the device, indicating the device’s excellent detection performance. The realization of this device opens up possibilities for developing chip-level integrated detectors suitable for VUV detection.