2010
DOI: 10.1587/elex.7.1499
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Investigation of source-to-drain capacitance by DIBL effect of silicon nanowire MOSFETs

Abstract: Abstract:We investigated the source-to-drain capacitance (C sd ) due to DIBL effect of silicon nanowire (SNW) MOSFETs. Short-channel SNW devices operating at high drain voltages have the positive value of C sd by DIBL effect. On the other hand, junctionless SNW MOSFETs without source/drain (S/D) P N junctions have negative or zero values by small DIBL effect. By considering the additional source-todrain capacitance component, the accuracy of a small-signal model was significantly improved on the imaginary part… Show more

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Cited by 4 publications
(1 citation statement)
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“…In the other JNTs, the surface of the nanowire is still depleted at V G =1V, which results in a significant lower gate capacitance. The gate charge needs to switch a device on being It is interesting to note that, in some cases, C gd can be zero or even negative in JNTs, due to the particularly low DIBL effect (13). This gives rise to a very low Miller capacitance, which might be of great interest for RF applications.…”
Section: Gate Capacitancementioning
confidence: 99%
“…In the other JNTs, the surface of the nanowire is still depleted at V G =1V, which results in a significant lower gate capacitance. The gate charge needs to switch a device on being It is interesting to note that, in some cases, C gd can be zero or even negative in JNTs, due to the particularly low DIBL effect (13). This gives rise to a very low Miller capacitance, which might be of great interest for RF applications.…”
Section: Gate Capacitancementioning
confidence: 99%