2017
DOI: 10.1016/j.carbon.2017.03.006
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Investigation of substrate temperature and cooling method on the properties of amorphous carbon films by hot-filament CVD with acetylene

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Cited by 25 publications
(21 citation statements)
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“…RMS roughness of carbon films with growth time of 30 s and 2 min were smaller relatively. The values were similar to the reported values by other technologies, such as direct current magnetron sputtering [ 19 ] and hot-filament chemical vapor deposition [ 17 ]. The difference was that the heat source was provided here directly by the flame for synthesis under normal pressure in this experiment.…”
Section: Resultssupporting
confidence: 89%
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“…RMS roughness of carbon films with growth time of 30 s and 2 min were smaller relatively. The values were similar to the reported values by other technologies, such as direct current magnetron sputtering [ 19 ] and hot-filament chemical vapor deposition [ 17 ]. The difference was that the heat source was provided here directly by the flame for synthesis under normal pressure in this experiment.…”
Section: Resultssupporting
confidence: 89%
“…As seen in Table 2 , G peaks were located around 1590–1610 cm −1 , and D peaks were located around 1350–1360 cm −1 . In theory, these films were amorphous carbon films [ 17 ]. And G peaks FWHM were lager, which represented high levels of disorder in the carbon films [ 43 ].…”
Section: Resultsmentioning
confidence: 99%
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“…The characteristic of HFCVD is that the catalytic role of the metallic substrate in decomposing the hydrocarbon precursors is taken over here by the heated filament that promotes the dissociation of gas carbon source and therefore the graphene films grown directly on glass at reduced temperatures could be achieved. Compared with PECVD and ECRCVD, HFCVD has some unique merits, including high deposition rate, easily handled substrate, and no damaging bombardment of energetic ions. , Although the decomposition ability problems can be resolved by either the filament in HFCVD or the plasma in PECVD and ECRCVD, it has been discovered that the films deposited on glass at reduced substrate temperatures by these methods still remain amorphous. …”
Section: Introductionmentioning
confidence: 99%