The InSe thin film was successfully grown on a glass/GaSe substrate using the modified chemical bath deposition (M-CBD) method and a group was annealed one hour at 80 °C in atmospheric conditions. The energy band gap ( ) values of the as-deposited and annealed films were defined 1,89 eV and 1,15 eV, respectively. The transmitance values (%) of the as-deposited and annealed films were asigned %0.65, %4.46 and %11,02, %10,35 at 400 and 700 nm, respectively. The I-V characteristics of the device at different temperatures was examined, the resistivity decreased and the conductivity increased with the increasing temperature. The activation energy in low temperature region was defined 0,05 eV, while it was defined 0.6 eV in high temperature region.