Investigation of uniformity degradation by intentionally induced fast beam glitch with a disk-slot batch type endstation

Abstract

Genus Inc. has recently developed unique circuitry to annihilate a source plasma by reducing the anode Voltage of the ion source when a source glitch is detected (an arc recovery circuit). The use of this circuitry together with additional electronics enabled the introduction of artificial source glitches with time duration of 1 msec to 1.2 sec. at an arbitrary scan position triggered by a manual switch. In this work, a description of this instrument and the electrical measurements of source arc related phenomena are given. Actual measurements of uniformity degradation by intentionally induced beam glitches using this device have been performed as a function of scan numbers, duration of glitches with a disk-slot type batch endstation.