2017
DOI: 10.1002/pssb.201600744
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Investigation of water splitting using III‐N structures

Abstract: Specifics of the water photoelectrolysis in KOH‐base aqueous solution using GaN‐based structures as working electrodes are studied. The structures were grown by HVPE and MOCVD techniques on sapphire substrates. In highly Si‐doped HVPE‐grown GaN layers (ND−NA ∼ 3 × 1018 cm−3) a barrier at the E1 offset potential dominates the current–potential (I–E) characteristics. The same dominant E1 offset potential was observed in MOCVD‐grown GaN/InGaN nanopillar structures after the treatment. The Debye screening effect i… Show more

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Cited by 5 publications
(2 citation statements)
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“…However, its solar‐to‐hydrogen (STH) efficiency is restricted by the lack of efficient photoanodes 1,2. Recently, the unique integration of photocatalysts and semiconductors, such as, InGaN nanorods and Si, has exhibited bright prospects and made great progress for PEC water oxidation 3–5. First, InGaN nanorods have much higher theoretical maximum STH efficiency of ≈27%, which exceeds most other metal oxides (TiO 2 and WO 3 ) that have been devoted great efforts 6–8.…”
Section: Introductionmentioning
confidence: 99%
“…However, its solar‐to‐hydrogen (STH) efficiency is restricted by the lack of efficient photoanodes 1,2. Recently, the unique integration of photocatalysts and semiconductors, such as, InGaN nanorods and Si, has exhibited bright prospects and made great progress for PEC water oxidation 3–5. First, InGaN nanorods have much higher theoretical maximum STH efficiency of ≈27%, which exceeds most other metal oxides (TiO 2 and WO 3 ) that have been devoted great efforts 6–8.…”
Section: Introductionmentioning
confidence: 99%
“…[120][121][122] The integration of efficient photocatalyst (InGaN NWs) and abundant semiconductor (Si) shows a promise for practical PEC water splitting. [109,123,124] Nowadays, InGaN NWs are generally epitaxially grown on Si substrate for solar water splitting. However, the introduced crystal defects of InGaN NWs and poor interface due to the lattice mismatch between InGaN and Si could trap the photogenerated charge carriers, leading to serious charge recombination.…”
Section: (9 Of 20)mentioning
confidence: 99%