Investigation on Blistering Behavior for n-type Silicon Solar Cells

Peng, Zih-Wei; Hsieh, Po Tsung; Lin, Yuan Jun; Huang, Chih Jeng; Li, Chi Chun

doi:10.1016/j.egypro.2015.07.117

Cited by 16 publications

(11 citation statements)

References 10 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Furthermore, the silanol group (Si-OH) ∼ 3670 cm −1 is one of the key indicators showing that hydrogen species are trapped by the oxide layer that formed after heat treatment. 43–45…”

Section: Resultsmentioning

confidence: 99%

High efficacy of activated carbon fabric filters and masks developed to prevent the inhalation of microorganisms and particles associated with respiratory tract infections

Francelino¹,

Petraconi²,

Miranda³

et al. 2022

Textile Research Journal

View full text Add to dashboard Cite

As a major international public health emergency, COVID-19 has posed many challenges for healthcare professionals who have been heavily exposed to contamination. This article describes the development of a high-filtration capacity mask consisting of filter-element layers interspersed with super-activated carbon fiber fabric, non-woven polypropylene for dental–medical–hospital use and antiviral polyamide with nanostructured SiO2 thin film coating. The study found 98.18% particle filtration efficiency and determined 2.11 mmH2O/cm2 differential pressure, while fluid repellency complied with Brazilian standard NBR ABNT 15052:2004.

show abstract

“…Furthermore, the silanol group (Si-OH) ∼ 3670 cm −1 is one of the key indicators showing that hydrogen species are trapped by the oxide layer that formed after heat treatment. 43–45…”

Section: Resultsmentioning

confidence: 99%

High efficacy of activated carbon fabric filters and masks developed to prevent the inhalation of microorganisms and particles associated with respiratory tract infections

Francelino¹,

Petraconi²,

Miranda³

et al. 2022

Textile Research Journal

View full text Add to dashboard Cite

show abstract

“…However, it is clear that both the SiO x layer thickness and the density increased with longer ozone pulse and higher ALD deposition temperature. [28] As the diffusivity of hydrogen in SiO 2 is two orders of magnitude higher than that in Al 2 O 3 at high temperature, [50] hydrogen originating from the Al 2 O 3 film can diffuse through the oxide layer to the silicon surface, accumulate near the SiO x /Si interface, [32,49,51] and form passivating Si-H bonds to reduce the surface defect density. On the other hand, if the Al 2 O 3 film is not initially hydrogen-rich, there is not enough hydrogen at the silicon/SiO 2 interface after thermal anneal to passivate the dangling bonds.…”

Section: Discussion About the Chemical Passivationmentioning

confidence: 99%

Ozone‐Based Atomic Layer Deposition of Al₂O₃ from Dimethylaluminum Chloride and Its Impact on Silicon Surface Passivation

Bao

Laitinen

Sajavaara

et al. 2017

Adv Elect Materials

View full text Add to dashboard Cite

Dimethylaluminum chloride (DMACl) as an aluminum source has shown promising potential to replace more expensive and commonly used trimethylaluminum in the semiconductor industry for atomic layer deposited (ALD) thin films. Here, the Al2O3 DMACl‐process is modified by replacing the common ALD oxidant, water, by ozone that offers several benefits including shorter purge time, layer‐by‐layer growth, and improved film adhesion. It is shown that the introduction of the ozone instead of water increases carbon and chlorine content in the Al2O3, while long ozone pulses increase the amount of interfacial hydrogen at silicon surface. These are found to be beneficial effects regarding the surface passivation and thus final device operation. Heat treatments (at 400 and 800 °C) are found to be essential for high quality surface passivation similar to ALD Al2O3 deposited from conventional precursors, which is correlated with the changes at the interface and related impurity distributions. The optimal deposition temperature is found to be 250 °C, which provides the best chemical passivation after thermal treatments.

show abstract

“…Increased blistering has been found to correlate with degraded surface passivation and decreased open-circuit voltage (V oc ) in silicon solar cells. [101,102,103,104] In a complex segmented device, such as a pixel detector, ruptured blisters pose a severe risk of short-circuits between elements in the detector, which may render the device non-functional. An example of blistering between segments can be seen in Fig.…”

Section: Blistering Of Al 2 Omentioning

confidence: 99%

AC-coupled n-in-p pixel detectors on MCz silicon with atomic layer deposition (ALD) grown thin film

Gädda

Ott

Bharthuar

et al. 2021

Nuclear Instruments and Methods in Physics Research Section A:

View full text Add to dashboard Cite

Investigation on Blistering Behavior for n-type Silicon Solar Cells

Cited by 16 publications

References 10 publications

High efficacy of activated carbon fabric filters and masks developed to prevent the inhalation of microorganisms and particles associated with respiratory tract infections

High efficacy of activated carbon fabric filters and masks developed to prevent the inhalation of microorganisms and particles associated with respiratory tract infections

Ozone‐Based Atomic Layer Deposition of Al₂O₃ from Dimethylaluminum Chloride and Its Impact on Silicon Surface Passivation

AC-coupled n-in-p pixel detectors on MCz silicon with atomic layer deposition (ALD) grown thin film

Contact Info

Product

Resources

About

Investigation on Blistering Behavior for n-type Silicon Solar Cells

Cited by 16 publications

References 10 publications

High efficacy of activated carbon fabric filters and masks developed to prevent the inhalation of microorganisms and particles associated with respiratory tract infections

High efficacy of activated carbon fabric filters and masks developed to prevent the inhalation of microorganisms and particles associated with respiratory tract infections

Ozone‐Based Atomic Layer Deposition of Al2O3 from Dimethylaluminum Chloride and Its Impact on Silicon Surface Passivation

AC-coupled n-in-p pixel detectors on MCz silicon with atomic layer deposition (ALD) grown thin film

Contact Info

Product

Resources

About

Ozone‐Based Atomic Layer Deposition of Al₂O₃ from Dimethylaluminum Chloride and Its Impact on Silicon Surface Passivation